User contributions for Harry

9 September 2025

• 13:3113:31, 9 September 2025 diff hist −1 Plassys Evaporator →Excecute your recipe
• 13:3113:31, 9 September 2025 diff hist +1,968 Plassys Evaporator →Standard Operating Procedure
• 12:3612:36, 9 September 2025 diff hist +873 Plassys Evaporator No edit summary
• 12:1412:14, 9 September 2025 diff hist +46 Plassys Evaporator →Overview
• 12:0912:09, 9 September 2025 diff hist −37 Plassys Evaporator →Currently loaded materials
• 09:1909:19, 9 September 2025 diff hist +653 N Probe station Created page with "In Qdev/ NBI cleanroom there are two probe stations for electrical characterisation. One on the 1st floor 03-1-111 (next to Qdev lounge) and one on the basement 03-K-08A (characterisation room with SEM and AFM). * '''1st floor probe station''': 2 probes and a Sysdey motherboard with 96 DC lines. It is connected to a He compressor, giving the possibility to reach down to ~4 K. * '''Basement probe station''': 6 probes and a pump cart connected to the chamber. Both tools..." current
• 09:0509:05, 9 September 2025 diff hist −533 Tools →Tool access requirement guidelines
• 08:5608:56, 9 September 2025 diff hist +27 Tools →Tool list

8 September 2025

• 15:4115:41, 8 September 2025 diff hist +59 Safety →Authorisation current
• 15:4015:40, 8 September 2025 diff hist 0 N File:Dosdonts.pdf No edit summary current
• 15:4015:40, 8 September 2025 diff hist +186 Safety →Authorisation
• 15:3315:33, 8 September 2025 diff hist +80 Safety →Sign up and training schedule
• 15:3315:33, 8 September 2025 diff hist 0 N File:Detailed introduction schedule.pdf No edit summary current
• 15:3215:32, 8 September 2025 diff hist −43 Safety No edit summary
• 15:3115:31, 8 September 2025 diff hist +1 Safety No edit summary
• 15:3115:31, 8 September 2025 diff hist +7 Safety No edit summary
• 15:3015:30, 8 September 2025 diff hist +224 Safety →Sign up
• 15:2415:24, 8 September 2025 diff hist −22 Safety No edit summary
• 15:2315:23, 8 September 2025 diff hist +9 Safety →Other
• 15:2315:23, 8 September 2025 diff hist +9 Safety →Authorisation
• 15:2215:22, 8 September 2025 diff hist −10 Safety →Other
• 15:2215:22, 8 September 2025 diff hist +88 Safety →Authorisation
• 15:2115:21, 8 September 2025 diff hist 0 N File:Cleanroom safety authorization checklist 2025.pdf No edit summary current
• 15:1915:19, 8 September 2025 diff hist +4 Safety →Authorisation
• 15:1915:19, 8 September 2025 diff hist +2,090 Safety No edit summary
• 14:2614:26, 8 September 2025 diff hist +465 N K&S bonder Created page with "{{Infobox tool |image = Tools KS bonder.jpg |toolfullname = K&S Inseto MPP 4523 |serial number = 610337 |website = https://www.https://www.inseto.com/ |company = inseto |description = Manual Fine Wire Bonder |location = 2nd floor lab (03.2.213) |primary = Harry |secondary = Nader }} K&S Bonder MPP 4523 is a manual bonder. It belongs to the 4500 Series Manual Fine Wire Bonder of inseto. Users typically use it to bond III/Vs with a Au wire to PCB daughterboards." current
• 14:1914:19, 8 September 2025 diff hist −23 Tools →Tool list
• 13:5413:54, 8 September 2025 diff hist −62 Adhesion promoter AR 300-80 NEW No edit summary current
• 13:5313:53, 8 September 2025 diff hist 0 N File:AR 300-80 info.pdf No edit summary current
• 13:5313:53, 8 September 2025 diff hist +1,101 N Adhesion promoter AR 300-80 NEW Created page with "We stock AR 300-80 adhesion promoter in the cleanroom, which is recommended if you have delamination issues. The promoter works with Si (SiO2) and other III-V semiconductors. We've tested it on GaSb with very nice results. * AR 300-80 info sheet. * Material safety data sheet. Recommended processing instructions: * Spin coat a clean chip with the adhesion promoter at 4000 rpm for 45-60 s. The manufacturer states..."
• 12:3812:38, 8 September 2025 diff hist +38 Resists →Electron beam resists current
• 12:3212:32, 8 September 2025 diff hist +3,281 N Ga removal from backside of GaAs wafers Created page with "When receiving GaAs wafers, they often come with a layer of gallium on the backside. This layer has turned out to cause quite some troubles, as it introduces an uneven surface on the backside of the wafers. The rough gallium on the backside tends to give high sample inclination and makes it difficult to handle small samples. You can request the growers to remove this Ga layer before shipping. Meanwhile, you need to remove the Ga from the wafers. =Techniques from John W..." current
• 12:2112:21, 8 September 2025 diff hist +45 Fabrication →Preparing your sample
• 12:2012:20, 8 September 2025 diff hist −31 Etching No edit summary current
• 12:1912:19, 8 September 2025 diff hist 0 N File:AJA1 Al.jpg No edit summary current
• 12:1912:19, 8 September 2025 diff hist 0 N File:AJA1 Au.jpg No edit summary current
• 12:1812:18, 8 September 2025 diff hist +767 Etching →Dry etching
• 12:1512:15, 8 September 2025 diff hist 0 N File:Milling.jpg No edit summary current
• 12:1512:15, 8 September 2025 diff hist +28 Etching →Erch rate with AJA2
• 12:1112:11, 8 September 2025 diff hist +8 Etching →Dry etching
• 12:1012:10, 8 September 2025 diff hist −938 Etching →Dry etching
• 12:0812:08, 8 September 2025 diff hist −107 Etching →24 mTorr
• 12:0512:05, 8 September 2025 diff hist +1,649 Etching No edit summary
• 10:0510:05, 8 September 2025 diff hist +1,007 N Preparation of solutions Created page with "=1M Citric acid solution= #Citric acid in powder form is kept in the cleanroom hallway. #Citric acid is solution is kept in dedicated bottles in CR1 cupboard(by the spin coater) ==Preparation of the bottle== # Clean the bottle with MQ water, multiple times # Take 1L MQ water in this bottle # Keep the bottle on Hot plate @ 85deg # Keep magnetic stirrer running # Take 193gm of Citric acid powder by using weighing balance accurately. (This is very important to weigh accura..." current
• 10:0410:04, 8 September 2025 diff hist +30 Fabrication →Processing your sample
• 10:0210:02, 8 September 2025 diff hist 0 N File:AR-P 6200 MSDS.pdf No edit summary current
• 10:0210:02, 8 September 2025 diff hist 0 N File:AR-P 6200 info.pdf No edit summary current
• 10:0110:01, 8 September 2025 diff hist −9 AR-P 6200 (CSAR) No edit summary current
• 10:0110:01, 8 September 2025 diff hist −12 AR-P 6200 (CSAR) No edit summary
• 10:0010:00, 8 September 2025 diff hist +1,537 N AR-P 6200 (CSAR) Created page with "Some users are experimenting with AR-P 6200 (CSAR 62) from ALLRESIST GmbH as an alternative to ZEP resists. This page contains information on the resist and the process recommended by Shiv. Documents from the supplier: * AR-P 6200 (CSAR 62) info sheet. * Material safety data sheet. We have the following resist solution stocked in the cleanroom: {| class="wikitable" |+CSAR attributes |- |'''CSAR dilutions''' |''..."