Plassys Evaporator

Overview

Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)

Currently loaded materials

Crucible position Material Comment 1 Ti Plassys ( currently In Use) 2 Al Plassys ( Material consumed) 3 Al Melted. Currently In Use 4 Al new pellets. Not melted Substrates allowed Silicon and Sapphire only