Main public logs
Jump to navigation
Jump to search
Combined display of all available logs of cleanroom. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 09:59, 19 August 2025 Harry talk contribs created page Sustainability (Created page with "Sustainability in a cleanroom is a difficult challenge. However, there's no time to waste – the best time to act is now. Our planet's health depends on it. In the cleanroom of the University of Copenhagen, we have already taken steps to reduce our day-to-day waste, and we are always active in discussing means to become more sustainable. We are always open to suggestions to decrease our environmental impact. =User's responsibility= * Reduce the amount of single-use m...")
- 13:52, 7 August 2025 Harry talk contribs uploaded a new version of File:Required cleanroom attire.png (typo)
- 13:50, 7 August 2025 Harry talk contribs uploaded a new version of File:Required cleanroom attire.png (more dpi)
- 13:49, 7 August 2025 Harry talk contribs uploaded a new version of File:Required cleanroom attire.png (replaced shoe covers with cleanroom clogs)
- 12:57, 7 August 2025 Harry talk contribs uploaded a new version of File:Required cleanroom attire.png
- 12:18, 6 August 2025 Harry talk contribs created page File:SU83000 SC.png (Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.)
- 12:18, 6 August 2025 Harry talk contribs uploaded File:SU83000 SC.png (Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.)
- 12:15, 6 August 2025 Harry talk contribs created page SU-8 (Created page with "SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical...")
- 09:28, 8 July 2025 Harry talk contribs created page File:Loomis tool.png
- 09:28, 8 July 2025 Harry talk contribs uploaded File:Loomis tool.png
- 13:18, 2 July 2025 Harry talk contribs created page Etching (Created page with "https://transene.com/etch-compatibility/ Data comparing different bottles of transene type D: Etching on Si, InAs (001), and GaAs(001)")
- 12:20, 26 May 2025 Harry talk contribs created page Waste handling (Created page with "Waste handling")
- 11:01, 20 May 2025 Harry talk contribs created page File:TTIP.png (TTIP Tetraisopropyl orthotitanate Ti[OCH(CH3)2]4 ALD precursor for titanium oxide)
- 11:01, 20 May 2025 Harry talk contribs uploaded File:TTIP.png (TTIP Tetraisopropyl orthotitanate Ti[OCH(CH3)2]4 ALD precursor for titanium oxide)
- 09:52, 20 May 2025 Harry talk contribs created page File:ALD1AlOx.png
- 09:52, 20 May 2025 Harry talk contribs uploaded File:ALD1AlOx.png
- 09:50, 20 May 2025 Harry talk contribs uploaded a new version of File:ALD1.png
- 16:31, 10 February 2025 Harry talk contribs created page ProSEM (Created page with "ProSEM is an image analysis software to measure features in digital images manually or automatically. It is part of the BEAMER package together with TRACER. At NBI it is available up to version '''2.9.2'''. The power of ProSEM is the ability to define a measurement ''recipe'' and apply it to multiple images. Any step of the recipe can be partly or fully scriptable. There are two useful [https://sds.genisys-gmbh.com/nextcloud/index.php/s/BMzQxeSLCymXDZS webinars...")
- 16:27, 10 February 2025 Harry talk contribs created page TRACER (Created page with "TRACER is part of the BEAMER software package. Using TRACER you can calculate a point spread function (PSF) for your specific substrate and material stack. It is done by defining material layers and running a Monte Carlo simulation for a large number of electrons. The result can be exported for use in Beamer PEC. [https://www.genisys-gmbh.com/tracer.html Website] == How to: make a PEC for a new material stack == This is a short step-by-step guide. For a more thoro...")
- 15:42, 10 February 2025 Harry talk contribs created page BEAMER (Created page with "Beamer is a software package used to process design files (.dxf, .gds, etc.) and make them ready for e-beam lithography machines. Crucially, it includes a proximity error correction (PEC) module. For any questions regarding Beamer use, please first refer to the manual: '''Help > Help Manual (F1).''' Elionix-specific documentation: '''Help > Formatter Notes > Elionix'''. It thoroughly covers all modules, their use, some theory, as well as includes helpful examples. On...")
- 17:30, 16 December 2024 Harry talk contribs created page Resist spin coating (Created page with "= How to behave = * Always think of safety first! * Wait patiently for the previous user to finish their process in the spin coater and then you can start using the fumehoom. * Minimise the duration for which the resist bottle stays open (without a lid). * Clean the spinner and the chuck until there are no resist marks left ** Use 1,3 Dioxolane for CSAR and LOR3B resists ** In any other case use Acetone = How to spin coat = * Log your process in the designat...")
