User contributions for Harry

A user with 425 edits. Account created on 16 August 2024.
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6 August 2025

  • 12:1812:18, 6 August 2025 diff hist +81 N File:SU83000 SC.png Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed. current
  • 12:1812:18, 6 August 2025 diff hist +103 SU-8 No edit summary
  • 12:1512:15, 6 August 2025 diff hist +1,106 N SU-8 Created page with "SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical..."
  • 12:0212:02, 6 August 2025 diff hist +4 Resists Photoresists

11 July 2025

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