Fabrication: Difference between revisions

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[[Fundamentals of lithography]]
[[Fundamentals of lithography]]


==Preparing your sample==  
=Preparing your sample=  
[[Resists]]
[[Resists]]


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[[Wafers]]
[[Wafers]]


==Preparing your design==
[[Ga removal from backside of GaAs wafers]]
 
=Preparing your design=


[[Doses]]
[[Doses]]
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[[TRACER]]
[[TRACER]]


==Processing your sample==
=Processing your sample=


[[Etching]]
[[Etching]]
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[[Category:Fabrication]]
[[Category:Fabrication]]


==Characterisation software==
=Characterisation software=


[[ProSEM]]
[[ProSEM]]

Latest revision as of 12:03, 12 September 2025

Computers and software

Design software

Cleanroom PCs

Booking Calendar

Lithography

Fundamentals of lithography

Preparing your sample

Resists

Resist spin coating

Cleaning

Wafers

Ga removal from backside of GaAs wafers

Preparing your design

Doses

BEAMER

TRACER

Processing your sample

Etching

Preparation of solutions

Characterisation software

ProSEM