Fabrication: Difference between revisions
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Tags: Undo Reverted |
Tag: Manual revert |
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[[Fundamentals of lithography]] | [[Fundamentals of lithography]] | ||
[[Design template for lithography training]] | |||
=Preparing your sample= | |||
[[Resists]] | [[Resists]] | ||
[[Resist spin coating]] | [[Resist spin coating]] | ||
[[ | [[Cleaning]] | ||
[[Wafers]] | |||
[[Ga removal from backside of GaAs wafers]] | |||
=Preparing your design= | |||
[[Doses]] | [[Doses]] | ||
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[[TRACER]] | [[TRACER]] | ||
=Processing your sample= | |||
[[Etching]] | |||
[[ | [[Preparation of solutions]] | ||
[[Category:Fabrication]] | [[Category:Fabrication]] | ||
=Characterisation software= | |||
[[ProSEM]] | |||
Latest revision as of 17:12, 17 February 2026
Computers and software
Lithography
Design template for lithography training
Preparing your sample
Ga removal from backside of GaAs wafers