Fabrication: Difference between revisions
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__NOTOC__ | |||
=Computers and software= | =Computers and software= | ||
[[Design | [[Remote access and N-Drive]] | ||
[[Cleanroom computers]] | |||
[[Design computers]] | |||
[[Design software]] | [[Design software]] | ||
[[ | [[Booking Calendar]] | ||
=Electron Beam Lithography= | |||
[[Recommended parameters for EBL]] | |||
[[Doses]] | |||
[[Design template for EBL]] | |||
[[BEAMER]] | |||
[[ | [[ProSEM]] | ||
[[TRACER]] | |||
=Lithography= | =Lithography= | ||
[[Fundamentals of lithography]] | [[Fundamentals of lithography]] | ||
== | =Materials & Processes in the NBI Cleanroom= | ||
==Materials== | |||
[[Resists]] | [[Resists]] | ||
[[ | [[Wafers]] | ||
== | ==Processes== | ||
[[ | [[Resist spin coating]] | ||
[[ | [[Cleaning]] | ||
[[ | [[Ga removal from backside of GaAs wafers]] | ||
[[ | [[Etching]] | ||
[[Preparation of solutions]] | |||
[[ | |||
[[Category:Fabrication]] | [[Category:Fabrication]] | ||
Latest revision as of 08:01, 14 April 2026
Computers and software
Electron Beam Lithography
Recommended parameters for EBL