Fabrication: Difference between revisions
Jump to navigation
Jump to search
Created page with "Resists" |
No edit summary |
||
| (38 intermediate revisions by 4 users not shown) | |||
| Line 1: | Line 1: | ||
__NOTOC__ | |||
=Computers and software= | |||
[[Remote access and N-Drive]] | |||
[[Cleanroom computers]] | |||
[[Design computers]] | |||
[[Design software]] | |||
[[Booking Calendar]] | |||
=Electron Beam Lithography= | |||
[[Recommended parameters for EBL]] | |||
[[Doses]] | |||
[[Design template for EBL]] | |||
[[BEAMER]] | |||
[[ProSEM]] | |||
[[TRACER]] | |||
=Lithography= | |||
[[Fundamentals of lithography]] | |||
=Materials & Processes in the NBI Cleanroom= | |||
==Materials== | |||
[[Resists]] | [[Resists]] | ||
[[Wafers]] | |||
==Processes== | |||
[[Resist spin coating]] | |||
[[Cleaning]] | |||
[[Ga removal from backside of GaAs wafers]] | |||
[[Etching]] | |||
[[Preparation of solutions]] | |||
[[Category:Fabrication]] | |||
Latest revision as of 08:01, 14 April 2026
Computers and software
Electron Beam Lithography
Recommended parameters for EBL