Fabrication: Difference between revisions
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[[Booking Calendar]] | [[Booking Calendar]] | ||
=Lithography= | =Electron Beam Lithography= | ||
[[ | |||
[[Recommended parameters for EBL]] | |||
[[Doses]] | |||
[[Design template for | [[Design template for EBL]] | ||
[[BEAMER]] | |||
[[ | |||
[[ | [[ProSEM]] | ||
[[ | [[TRACER]] | ||
[[ | =Lithography= | ||
[[Fundamentals of lithography]] | |||
[[ | =Materials & Processes in the NBI Cleanroom= | ||
==Materials== | |||
[[Resists]] | |||
[[Wafers]] | |||
==Processes== | |||
[[ | [[Resist spin coating]] | ||
[[ | [[Cleaning]] | ||
[[Ga removal from backside of GaAs wafers]] | |||
[[Etching]] | [[Etching]] | ||
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[[Category:Fabrication]] | [[Category:Fabrication]] | ||
Latest revision as of 08:01, 14 April 2026
Computers and software
Electron Beam Lithography
Recommended parameters for EBL