Fabrication: Difference between revisions

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[[Booking Calendar]]
[[Booking Calendar]]


=EBL and GenISys software=
=Electron Beam Lithography=


[[Recommended parameters for EBL]]
[[Recommended parameters for EBL]]

Latest revision as of 08:42, 9 April 2026

Computers and software

Remote access and N-Drive

Cleanroom computers

Design computers

Design software

Booking Calendar

Electron Beam Lithography

Recommended parameters for EBL

Doses

BEAMER

ProSEM

TRACER

Lithography

Fundamentals of lithography

Design template for lithography training

Preparing your sample

Resists

Resist spin coating

Cleaning

Wafers

Ga removal from backside of GaAs wafers


Processing your sample

Etching

Preparation of solutions

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