Recommended parameters for EBL

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Revision as of 08:12, 9 April 2026 by Harry (talk | contribs) (Created page with "= Cleanroom recommendations= {| class="wikitable" |+125 kV |- |Resist |Si |InAs<sup>UC</sup> |InP<sup>UC</sup> |GaAs<sup>UC</sup> |SiGe |- |A2 |1000 |700 |? |? |? |- |A4 |1200-1300 <ref name="Kringhoej" /> |700 |900 <ref name="Hertel" /> |630 |? |- |A6 |1200 |800 |900-920 <ref name="Hertel" /> |760 |? |- |EL6 |? |? |? |? |? |- |EL9 |450-500 <ref name="Kringhoej">[https://nbi.ku.dk/english/theses/phd-theses/anders-kringhoej/Anders_Kringhoej_P...")
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Cleanroom recommendations

125 kV
Resist Si InAsUC InPUC GaAsUC SiGe
A2 1000 700 ? ? ?
A4 1200-1300 [1] 700 900 [2] 630 ?
A6 1200 800 900-920 [2] 760 ?
EL6 ? ? ? ? ?
EL9 450-500 [1] ? 280 [2] 420 ?
CSAR4 430 ? ? ? ?
CSAR9 500 [1] ? ? ? ?
CSAR13 430 [1] ? ? 350 ?
50k+A4 ? ? 500 [2] 745 ?
100 kV
Resist Si InAsUC InPUC GaAsUC SiGe
A2 900 ? 620 [3] ? 1500-1600 [4]
A4 900 640-680 [5] 608-640 [3] 630 900 [4]
A6 1000 ? ? 670 ?
EL6 ? ? ? ? ?
EL9 ? 250 380 [2] 200 [3] ?
CSAR4 400 ? ? ? 335 [4]
CSAR9 ? ? ? ? 335 [4]
CSAR13 ? ? ? ? ?
50k+A4 ? ? ? 630 ?


How to choose the correct parameters yourself

A good place to start is the Unofficial dose calculator

  • Choose the EBL tool (100 or 125 keV)
  • Write field size (µm) and Dots: The combination of these two will give you the pixel size for a default pitch of 1.
    • It is recommended to use high number of dots with a pitch multiplier for fine exposures
  • Aperture and Beam current: The combination of these two will give you the beam spot size

The pixel size should be equal to the beam spot size

  • Area dose: The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the Doses page
  1. ↑ 1.0 1.1 1.2 1.3 Kringhøj PhD thesis
  2. ↑ 2.0 2.1 2.2 2.3 2.4 Hertel PhD thesis
  3. ↑ 3.0 3.1 3.2 Drachmann PhD thesis
  4. ↑ 4.0 4.1 4.2 4.3 Ansaloni PhD thesis
  5. ↑ Whiticar PhD thesis
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