Tools: Difference between revisions

Revision as of 20:00, 15 February 2016

Lithography	Thin film processing	Characterization	Other
Raith eLine Elionix Heidelberg µPG 501 Süss mask aligner	AJA Systems E-Gun evaporator Edwards evaporator Spinners ALD 1 ALD 2 Leica sputter coater MBE	JEOL JSM 6320F JEOL JSM 7800F Raith eLine TEM Alphastep Optical profiler Optical microscopes AFM	Süss scriber Scriber Loomis RTP AW 610 Biorad oven µ-wave plasma oven Denier RF-asher K&S Ball Bonder Präzitherm hotplates

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 * AFM
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-* [[Scriber Süss]]
+* [[Süss scriber]]
 * Scriber Loomis
 * [[RTP AW 610]]