Training

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form (NBI-Cleanroom Training Request Form). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically 90 days) for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

Cleanroom General Introduction

Cleanroom General Introduction

Before attending the training session, all users must read and familiarize themselves with the relevant safety information (Safety). Expand to view more information.

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• The introductory session is scheduled from 09:15 to 15:00.
• Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email (cleanroom@nbi.ku.dk).
• If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
• Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
• The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
• Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
• Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
• Standard Training Program:
  • 09:15-10:30: Cleanroom introduction
  • Coffee break
  • 10:45-12:00: Asher, spinners and optical microscopes
  • Lunch break
  • 13:00-14:00: Practical information
  • 14:00-15:00: Q&A and account setup

Chemical handling

HF handling

Request an HF handling training via cleanroom@nbi.ku.dk.

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Send an email with the following info before the training can be arranged:

• The name of the person you have supported as an HF-buddy and the number of times you've done it (at least 2).
• Before training, read the safety information carefully: https://wiki.nbi.ku.dk/cleanroom/HF_safety
• Before training, fill out the questionnaire related to HF handling that you will receive from a CR staff.

HF handling requires strict safety protocols. In the case that the user is not prepared for the training, the instructor has the right to stop the training.

Lithography

Elionix 7000 (100 kV)

Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.

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Prerequisites

• You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
• Elionix is a high level tool. Make sure you are already trained to:
  • Enter the cleanroom
  • Use the microscope, spinner, asher

Training

• You'll need 4 sessions to get trained on this tool.
  • Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
  • Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
  • Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
  • Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

Preparation

Before any training slots are booked on the tool you'll need all of the following prepared:

• Shadow senior users on the tool 2-3 times.
• Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
• Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both x and y directions. If you don't know how to start, check the Design template for EBL.
• Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
• Make sure all write fields are entirely in the positive coordinate space.
• Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.

Elionix F-125 (125 kV at QuanTech)

Contact Zhe Liu to arrange access and training for Elionix F-125.

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• Please contact Zhe Liu (zhe.liu@nbi.ku.dk)

Heidelberg upg501

Prepare your design file and coated chip before requesting Heidelberg upg501 training.

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• Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
• Have a chip spin coated with an appropriate photoresist before the training session.
  • The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
• What is your project alias? If unsure, contact your supervisor first.

Before the training session:

• Watch the instruction video and read the standard operating procedure on the Heidelberg µPG 501 tool page, shadow the tool with your group members, and ask for a sign-off session.

Characterization

Bruker Dimension Icon AFM

Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.

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• AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
• Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures (AFM). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
• Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.

JEOL 7800F SEM-EDS

JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.

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• SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
• Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures (JEOL JSM-7800F). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
• Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.

JEOL 7800F Prime SEM (QuanTech)

JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.

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• SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
• Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures (JEOL JSM-7800F). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
• Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.

Training is usually 2-3 sessions of 2-hour per session.

Thermo Fisher Scientific Talos F200i S/TEM

Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.

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• This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
• Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.

Raith e-Line

Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.

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• A design (gds, dxf, cif) for sessions 1 & 2 with:
  • 4 alignment crosses (find out what marks work on the tool from your sub-group).
  • Something to break the symmetry so you can tell chip orientation with your bare eye.
  • A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
  • Something creative, somethin fun :) This is an exercise in learning CAD as well.
• What is your project alias? If unsure, contact your supervisor first.

Woollam alpha-SE Ellipsometer

Request Woollam alpha-SE Ellipsometer training via cleanroom@nbi.ku.dk.

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Filmetrics reflectometer

Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.

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• Please contact Zhe Liu (zhe.liu@nbi.ku.dk)

Thin Film Deposition

Plassys Evaporator

A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the training form.

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Confirmation

Once you sign up via the form, the tool responsible will contact you for the following details:

• Confirm that you have a sample ready.
• Confirm that you have shadowed your colleagues using the tool 2-3 times.
• Specify process steps you want to run

  Materials, thickness, tilt, milling, oxidation

• The name of the recipe.

Restrictions

• Only Si and sapphire samples are allowed in the chamber.

Training

• You'll need 2 sessions to get trained on this tool.
  • Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
  • Session 2 (2 hr.) - sign off session

The instructor has the right to ask for additional training sessions.

AJA1 and AJA2: metallization, sputtering or ion milling

Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the training form.

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Confirmation

Once you sign up via the form, the tool responsible will contact you for the following details:

• Confirm that you have a sample ready.
• Confirm that you have shadowed your colleagues using the tool 2-3 times.
• Specify process steps you want to run

  Materials, thickness, tilt, milling, oxidation

• Which tool do you want to use?
  • AJA1
    • e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
    • DC sputtering: Nb2Ti, Ti
    • DC Kaufman milling
    • Oxidation
    • Stage rotation, no stage cooling
  • AJA2
    • e-beam materials: Ti, Al, Au, Cr, Pt, Pd
    • DC sputtering: Ti
    • RF sputtering: Ti, Nb2Ti
    • RF milling
    • Stage cooling, no stage rotation
• Specify the process steps you want to run.

  Either the name of the recipe or all required process parameters.

Before the training session

• Watch the instruction video(s)
• Read the standard operating procedure on the AJA Systems tool page.

Training

• You'll need 2 sessions to get trained on this tool.
  • Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
  • Session 2 ( 2 hr.) - sign off session

The instructor has the right to ask for additional training sessions.

ALD1 and ALD2

Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the training form.

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Confirmation

Once you sign up via the form, the tool responsible will contact you for the following details:

• Confirm that you have a sample ready.
• Confirm that you have shadowed your colleagues using the tool 2-3 times.
• Which tool do you want to use?
  • ALD1 available grown oxides: AlOx, HfOx, TiOx
  • ALD2 available grown oxides: AlOx, HfOx, ZrOx
  • In ALD1, you are allowed to use resist for lift-off processes. In ALD2, you are not allowed to use a sample with resist on.
• Specify the process steps you want to run.
  • Either the name of the recipe or all required process parameters.

Before the training session

• Watch the instruction video(s)
• Study the ALD principles
• Read the standard operating procedure on the ALD tool page.

Training

You'll need 2 sessions to get trained on this tool.

• Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
• Session 2 (30 mins) - sign off session

  Note: An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).

The instructor has the right to ask for additional training sessions.

Packaging

F&S autobonder

Prepare shadowing and bonding documentation, then request F&S autobonder training.

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Send an email with the following info before the training can be arranged:

• Shadow colleagues using the tool 2-3 times.
• You must have a chip for bonding.
• You must know which daughterboard you will use for bonding.
• You must know what material you use to mount the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
• You must prepare a bonding schematic and have one of your team members verify that it is correct.
• What is your project alias? If unsure, contact your supervisor first.
• Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
• Request a training session at this point.

Two training sessions are required to get access to the bonder:

1. 3 hours: Basic bonder training and chip bonding
2. 2 hours: Sign-off session

Manual bonder

Request manual bonder training via cleanroom@nbi.ku.dk.

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Miscellaneous

Micromanipulator

Complete group-level training first, then request a micromanipulator sign-off session.

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• Please get trained within your research group first. Then request a sign-off session.
• What is your project alias? If unsure, contact your supervisor first.