Training

A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For all training requests, please read the prerequisites below and afterwards contact cleanroom@nbi.ku.dk. A cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the cleanroom booking system. However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

Bruker Dimension Icon Atomic Force Microscope (AFM)

• Have a sample ready that you want to characterise. Think about what you want to learn about the sample; step heights, roughness, etc.
• Only ask for training if you plan on using the tool regularly.
• Training is usually 2-3 sessions of 1.5 hours.

Elionix 7000 (100 kV)

Prerequisites

• You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
• Elionix is a high level tool. Make sure you are already trained to:
  • enter the cleanroom;
  • use the microscope, spinner, asher;
  • SEM training is preferred but not mandatory

Training

• You'll need 4 sessions to get trained on this tool.
  • Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
  • Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
  • Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
  • Session 4 involves exposing a "real" pattern on a "real" chip on your own.

Preparation

Before any training slots are booked on the tool you'll need all of the following prepared:

• Shadow someone on the tool 2-3 times before starting the prep.
• Si chip (5-20 mm square) spin coated with A4 and baked at 185C/2mins. This chip will be used for sessions 1 & 2. This has to be a dummy chip.
• A chip for your 3rd session. This is a "real" chip. Plan this internally within your group.
• A design (GDS is preferred, DXF might work) for sessions 1 & 2 with:
  • 4 alignment crosses (find out what marks work on the tool from your group). The crosses should be a few millimeters apart. Make sure each cross is within one writefield when converting the design in WeCaS.
  • Something to break the symmetry so you can tell chip orientation with your bare eye after the 1st exposure.
  • A pattern that you will use to test overlay quality (alignment precision between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both x and y directions.
  • Something creative, something fun :) This is an exercise in learning CAD as well.
• A design for the "real" chip to be exposed in session 3.

You'll also need a software session of about 0.5 hrs -- arrange this with an Elionix superuser within your group. Then follow workflow 0 at the Qdev wiki to convert your design files into the Elionix exposure format .co7.

• Make dedicated folders for each exposure.
• Make sure all writefields are entirely in the positive coordinate space.
• Make sure neither exposure will take longer than 15 minutes at 500 pA current and dose of 1000 uC/cm2.
• Prepare and test schedule files.
• Note: Do not use Beamer to prep the Elionix .con files for sessions 1 & 2.

Checklist

Here's a final checklist. Please email the answers to all questions to cleanroom@nbi.ku.dk only after you are done with the preparation steps.

• Have you shadowed someone on the tool? If yes, who? How many times?
• Do you have a silicon chip with A4 resist? What are its dimensions with +-0.1 mm accuracy? How did you measure this?
• Do you have .con and .sch files prepared? Where on Z drive are the? Provide a full path.
• How long do the 1st and 2nd exposures take exactly? Is it under 15 minutes?
• Do you have a real chip + design planned with your group?
• What is your project alias? If unsure, contact your supervisor first.

Elionix F-125 (125 kV at QuanTech)

• Please contact Zhe Liu (zhe.liu@nbi.ku.dk)

Heidelberg upg501

• Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
• Have a chip spin coated with an appropriate photoresist before the training session.
  • The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
• What is your project alias? If unsure, contact your supervisor first.

Before the training session:

• Watch the instruction video and read the standard operating procedure on the Heidelberg µPG 501 tool page

Raith e-Line

• A design (gds, dxf, cif) for sessions 1 & 2 with:
  • 4 alignment crosses (find out what marks work on the tool from your sub-group).
  • Something to break the symmetry so you can tell chip orientation with your bare eye.
  • A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
  • Something creative, somethin fun :) This is an exercise in learning CAD as well.
• What is your project alias? If unsure, contact your supervisor first.

JEOL 7800-F

• Training takes about 2-3 sessions.
• You need a chip/sample to be imaged before a session is booked.
• Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
• Request the training session only once you have gathered the chips and information.
• What is your project alias? If unsure, contact your supervisor first.

JEOL 7800-F prime (QuanTech)

• Please contact Zhe Liu (zhe.liu@nbi.ku.dk)

AJA metallization, sputtering or ion milling

Send an email with the following info before the training can be arranged:

• The name of the person you have shadowed and the number of times you've done it.
• Confirm that you have a sample ready.
• Which tool you want to use: AJA1 or AJA2?
• What process steps do you want to run?
  • Either the recipe name for automatic recipes or all required process parameters.
• What is your project alias? If unsure, contact your supervisor first.

Before the training session:

• Watch the instruction video on how to load/unload and read the standard operating procedures on the AJA Systems tool page

ALD 1 & 2

Send an email with the following info before the training can be arranged:

• The name of the person you have shadowed and the number of times you've done it.
• Confirm that you have a sample ready.
• Which tool you want to use.
• What process steps you want to run.
  • Either the recipe name or all required process parameters.
  • How long does the process take.
• What is your project alias? If unsure, contact your supervisor first.

Before the training session:

• Watch the instruction video(s) and read the standard operating procedure on the ALD tool page.

F&S autobonder

• Shadow colleagues using the tool 2-3 times.
• You must have a chip for bonding.
• Figure out which daughterboard is it that your team/fridge needs.
• Have a colleague show your how to glue the chip to the daughterboard with silver paint, PMMA or whatever is specific to your measurement.
• What is your project alias? If unsure, contact your supervisor first.
• Request a training session at this point.

Filmetrics reflectometer

• Please contact Zhe Liu (zhe.liu@nbi.ku.dk)

Micromanipulator

• Please get trained within your research group first. Then request a sign-off session.
• What is your project alias? If unsure, contact your supervisor first.