Leica sputter coater: Difference between revisions
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m Petur moved page DC sputter to Leica sputter coater without leaving a redirect |
added product website, room clarification, tool alternatives |
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{{Infobox tool | |||
|image = Tool Leica.jpg | |||
|toolfullname = Leica EM SDC005 | |||
|website = https://www.leica-microsystems.com/products/sample-preparation-for-electron-microscopy/p/leica-em-scd005/ | |||
|company = Leica Microsystems | |||
|description = Table-top sputter coater | |||
|location = 2nd floor lab (03.2.213) | |||
|primary = Nader | |||
|manual = Printed copy next to instrument | |||
}} | |||
Other material deposition alternatives at the [[Main Page|NBI cleanroom]]: | |||
* [[Cambridge ALD|ALD systems]] | |||
* [[AJA systems]] for sputtering/e-gun evaporation | |||
* [[E-Gun evaporator]] | |||
* [[Edwards evaporator|Edwards thermal evaporator]] | |||
* [[MBE|Molecular beam epitaxy system]] | |||
[[Category:Tools]] | |||
[[Category:Deposition]] | |||
Latest revision as of 11:22, 10 April 2022
 | |
| Essentials | |
|---|---|
| Full name | Leica EM SDC005 |
| Manufacturer | Leica Microsystems |
| Description | Table-top sputter coater |
| Location | 2nd floor lab (03.2.213) |
| Manual | Printed copy next to instrument |
| Responsibility | |
| Primary | Nader |
Other material deposition alternatives at the NBI cleanroom:
- ALD systems
- AJA systems for sputtering/e-gun evaporation
- E-Gun evaporator
- Edwards thermal evaporator
- Molecular beam epitaxy system