Doses: Difference between revisions
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updated dose table with values from PhD theses |
added links to tools and resists |
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| Line 1: | Line 1: | ||
{| class="wikitable" | {| class="wikitable" | ||
|+125 kV | |+[[Elionix F-125|125 kV]] | ||
|- | |- | ||
| | |[[Resists|Resist]] | ||
|Si | |Si | ||
|InAs<sup>UC</sup> | |InAs<sup>UC</sup> | ||
| Line 25: | Line 25: | ||
|A6 | |A6 | ||
|1200 | |1200 | ||
| | |800 | ||
|900-920 <ref name="Hertel" /> | |900-920 <ref name="Hertel" /> | ||
|760 | |760 | ||
| Line 75: | Line 75: | ||
{| class="wikitable" | {| class="wikitable" | ||
|+100 kV | |+[[Elionix 7000|100 kV]] | ||
|- | |- | ||
| | |[[Resists|Resist]] | ||
|Si | |Si | ||
|InAs<sup>UC</sup> | |InAs<sup>UC</sup> | ||
| Line 114: | Line 114: | ||
|EL9 | |EL9 | ||
|? | |? | ||
| | |250 | ||
|380 <ref name="Hertel">[https://nbi.ku.dk/english/theses/phd-theses/hertel/dissertation_Hertel.pdf Hertel PhD thesis]</ref> | |380 <ref name="Hertel">[https://nbi.ku.dk/english/theses/phd-theses/hertel/dissertation_Hertel.pdf Hertel PhD thesis]</ref> | ||
|200 <ref name="Drachmann" /> | |200 <ref name="Drachmann" /> | ||
| Line 153: | Line 153: | ||
* InAs: Uniform clearing | * InAs: Uniform clearing | ||
* Si: Optimal contrast | * Si: Optimal contrast | ||
== References == | |||
<references /> | |||
== Note == | == Note == | ||
| Line 185: | Line 189: | ||
|+100 kV | |+100 kV | ||
|- | |- | ||
| | |[[Resists|Resist]] | ||
|Si (μC/cm<sup>2</sup>) '''/''' φ | |Si (μC/cm<sup>2</sup>) '''/''' φ | ||
|InAs (μC/cm<sup>2</sup>) '''/''' φ | |InAs (μC/cm<sup>2</sup>) '''/''' φ | ||
| Line 261: | Line 265: | ||
|+125 kV | |+125 kV | ||
|- | |- | ||
| | |[[Resists|Resist]] | ||
|Si (μC/cm<sup>2</sup>) '''/''' φ | |Si (μC/cm<sup>2</sup>) '''/''' φ | ||
|InAs (μC/cm<sup>2</sup>) '''/''' φ | |InAs (μC/cm<sup>2</sup>) '''/''' φ | ||
| Line 332: | Line 336: | ||
|- | |- | ||
|} | |} | ||
[[Category:Fabrication]] | |||
Latest revision as of 18:23, 10 April 2022
| Resist | Si | InAsUC | InPUC | GaAsUC | SiGe |
| A2 | 1000 | 700 | ? | ? | ? |
| A4 | 1200-1300 [1] | 700 | 900 [2] | 630 | ? |
| A6 | 1200 | 800 | 900-920 [2] | 760 | ? |
| EL6 | ? | ? | ? | ? | ? |
| EL9 | 450-500 [1] | ? | 280 [2] | 420 | ? |
| CSAR4 | 430 | ? | ? | ? | ? |
| CSAR9 | 500 [1] | ? | ? | ? | ? |
| CSAR13 | 430 [1] | ? | ? | 350 | ? |
| 50k+A4 | ? | ? | 500 [2] | 745 | ? |
| Resist | Si | InAsUC | InPUC | GaAsUC | SiGe |
| A2 | 900 | ? | 620 [3] | ? | 1500-1600 [4] |
| A4 | 900 | 640-680 [5] | 608-640 [3] | 630 | 900 [4] |
| A6 | 1000 | ? | ? | 670 | ? |
| EL6 | ? | ? | ? | ? | ? |
| EL9 | ? | 250 | 380 [2] | 200 [3] | ? |
| CSAR4 | 400 | ? | ? | ? | 335 [4] |
| CSAR9 | ? | ? | ? | ? | 335 [4] |
| CSAR13 | ? | ? | ? | ? | ? |
| 50k+A4 | ? | ? | ? | 630 | ? |
- GaAs: Uniform clearing
- InP: Uniform clearing
- InAs: Uniform clearing
- Si: Optimal contrast
References
Note
Base dose does not change with resist thickness, developing time does. However, if the developing time is fixed, say to 60s, a thinner layer of resist will need lower "base dose", since it's being over developed.
Experimental
- Dose density matrix for small and large spot size.
- Measure CD as a function of dose and density for the two spot sizes.
- Intersection of the two plots, for a given density gives isofocal dose.
- Convert doses to dose factors, given that 0% iso-dose factor == PEC_df 0%
- Base dose == isofocal dose 0% / PEC_df 0%
- For density larger than 0%, predicted dose factor = (1+η)/(1+η*ρ*(1+φ/100))
- 1+η = PEC_df 0%
- Fit experimental isofocal dose factors and predicted dose factor by varying psi
100 kV:
Si: 897 uC/cm2 and phi = 75%
125 kV:
InP: 572 uC/cm2 and phi = 41%
InAs: 589 uC/cm2 and phi = 33%
Si: 906 uC/cm2 and phi = 45%
GaAs:752 uC/cm2 and phi = 39%
| Resist | Si (μC/cm2) / φ | InAs (μC/cm2) / φ | InP (μC/cm2) / φ | GaAs (μC/cm2) / φ | SiGe (μC/cm2) / φ |
| A2 | ? | ? | ? | ? | ? |
| A4 | 897 / 75% | ? | ? | ? | ? |
| A6 | ? | ? | ? | ? | ? |
| El6 | ? | ? | ? | ? | ? |
| El9 | ? | ? | ? | ? | ? |
| CSAR4 | ? | ? | ? | ? | ? |
| CSAR9 | ? | ? | ? | ? | ? |
| CSAR13 | ? | ? | ? | ? | ? |
| 50k+A4 | ? | ? | ? | ? | ? |
| Resist | Si (μC/cm2) / φ | InAs (μC/cm2) / φ | InP (μC/cm2) / φ | GaAs (μC/cm2) / φ | SiGe (μC/cm2) / φ |
| A2 | ? | ? | ? | ? | ? |
| A4 | 906/ 45% | 589/ 33% | 572/ 41% | 752/ 39% | ? |
| A6 | ? | ? | ? | ? | ? |
| El6 | ? | ? | ? | ? | ? |
| El9 | ? | ? | ? | ? | ? |
| CSAR4 | ? | ? | ? | ? | ? |
| CSAR9 | ? | ? | ? | ? | ? |
| CSAR13 | ? | ? | ? | ? | ? |
| 50k+A4 | ? | ? | ? | ? | ? |