Recommended parameters for EBL: Difference between revisions
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Created page with "= Cleanroom recommendations= {| class="wikitable" |+125 kV |- |Resist |Si |InAs<sup>UC</sup> |InP<sup>UC</sup> |GaAs<sup>UC</sup> |SiGe |- |A2 |1000 |700 |? |? |? |- |A4 |1200-1300 <ref name="Kringhoej" /> |700 |900 <ref name="Hertel" /> |630 |? |- |A6 |1200 |800 |900-920 <ref name="Hertel" /> |760 |? |- |EL6 |? |? |? |? |? |- |EL9 |450-500 <ref name="Kringhoej">[https://nbi.ku.dk/english/theses/phd-theses/anders-kringhoej/Anders_Kringhoej_P..." |
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= Cleanroom recommendations= | = Cleanroom recommendations= | ||
''This section needs additional data'' | |||
{| class="wikitable" | {| class="wikitable" | ||
|+[[Elionix F-125|125 kV]] | |+[[Elionix F-125|125 kV]] | ||
|- | |- | ||
| | |Field Size (µm) | ||
|Dots | |||
|Pitch | |||
|Pixel size (nm) | |||
|Aperture (µm) | |||
|Beam current (A) | |||
|Beam spot (nm) | |||
| | |||
| | |||
| | |||
| | |||
| | |||
| | |||
|- | |- | ||
| | |500 | ||
| | |50000 | ||
| | |8 | ||
| | |80 | ||
| | |240 | ||
| | |60e-9 | ||
|83.3 | |||
|- | |- | ||
| | |500 | ||
| | |1000000 | ||
| | |5 | ||
| | |2.5 | ||
| | |60 | ||
| | |1e-9 | ||
|2.6 | |||
|- | |- | ||
|- | |- | ||
|} | |} | ||
| Line 78: | Line 36: | ||
|+[[Elionix 7000|100 kV]] | |+[[Elionix 7000|100 kV]] | ||
|- | |- | ||
| | |Field Size (µm) | ||
| | |Dots | ||
| | |Pitch | ||
| | |Pixel size (nm) | ||
| | |Aperture (µm) | ||
| | |Beam current (A) | ||
|Beam spot (nm) | |||
|- | |- | ||
| | |600 | ||
| | |20000 | ||
| | |7 | ||
| | |210 | ||
|250 | |250 | ||
| | |20e-9 | ||
| | |218.6 | ||
|- | |- | ||
| | |600 | ||
| | |240000 | ||
| | |1 | ||
| | |2.5 | ||
| | |40 | ||
| | |500e-12 | ||
|2.7 | |||
|- | |- | ||
|- | |- | ||
|} | |} | ||
= How to choose the correct parameters yourself = | = How to choose the correct parameters yourself = | ||
| Line 161: | Line 73: | ||
<blockquote style="background-color: #F0F0F0; border: dashed thin grey;"> | <blockquote style="background-color: #F0F0F0; border: dashed thin grey;"> | ||
The '''pixel size''' should be equal to the '''beam spot size''' | The '''pixel size''' should be roughly equal to the '''beam spot size''' | ||
</blockquote> | </blockquote> | ||
* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page | * '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page | ||
Latest revision as of 08:45, 9 April 2026
Cleanroom recommendations
This section needs additional data
| Field Size (µm) | Dots | Pitch | Pixel size (nm) | Aperture (µm) | Beam current (A) | Beam spot (nm) |
| 500 | 50000 | 8 | 80 | 240 | 60e-9 | 83.3 |
| 500 | 1000000 | 5 | 2.5 | 60 | 1e-9 | 2.6 |
| Field Size (µm) | Dots | Pitch | Pixel size (nm) | Aperture (µm) | Beam current (A) | Beam spot (nm) |
| 600 | 20000 | 7 | 210 | 250 | 20e-9 | 218.6 |
| 600 | 240000 | 1 | 2.5 | 40 | 500e-12 | 2.7 |
How to choose the correct parameters yourself
A good place to start is the Unofficial dose calculator
- Choose the EBL tool (100 or 125 keV)
- Write field size (µm) and Dots: The combination of these two will give you the pixel size for a default pitch of 1.
- It is recommended to use high number of dots with a pitch multiplier for fine exposures
- Aperture and Beam current: The combination of these two will give you the beam spot size
The pixel size should be roughly equal to the beam spot size
- Area dose: The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the Doses page