Cambridge ALD: Difference between revisions
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|company = Cambridge NanoTech (Veeco) | |company = Cambridge NanoTech (Veeco) | ||
|description = Atomic layer deposition system | |description = Atomic layer deposition system | ||
|location = | |location = Cleanroom 1 (03.2.209A)<br />Cleanroom 2 (03.2.203B) | ||
|primary = | |primary = Harry | ||
|secondary = | |secondary = Martin | ||
}} | }} | ||
Two nearly identical Savannah S100-like systems are used for atomic layer deposition of aluminum oxide and hafnium oxide. | |||
Other material deposition alternatives at the [[Main Page|NBI cleanroom]]: | |||
* [[AJA systems]] for sputtering/e-gun evaporation | |||
* [[E-Gun evaporator]] | |||
* [[Edwards evaporator|Edwards thermal evaporator]] | |||
* [[Leica sputter coater]] | |||
* [[MBE|Molecular beam epitaxy system]] | |||
== Growth per cycle (GPC) monitoring == | == Growth per cycle (GPC) monitoring == | ||
<gallery mode="traditional"> | <gallery mode="traditional"> | ||
Image:ALD1.png | Image:ALD1.png|ALD1 HfOx | ||
Image:ALD2.png| | Image:ALD2.png|ALD2 HfOx | ||
</gallery> | </gallery> | ||
| Line 25: | Line 35: | ||
| Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050] | | Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050] | ||
|- | |- | ||
| Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: # | | Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1134/1.1626763] | ||
|} | |} | ||
== Standard operating procedure == | == Standard operating procedure == | ||
Video on how to operate ALD 1: | |||
[[File:ALD1.mp4|500px]] | |||
* [https://youtu.be/Do91YRRgI34 Click here to watch the video on YouTube] | |||
Video on how to operate ALD 2: | |||
[[File:ALD2.mp4|500px]] | |||
* [https://www.youtube.com/watch?v=GmNEbyMNC4A Click here to watch the video on YouTube] | |||
* Log the base pressure on the Excel notebook. | |||
* Open valve on top of the nitrogen bottle. | * Open valve on top of the nitrogen bottle. | ||
* Check nitrogen bottle pressure | * Check the nitrogen bottle pressure: | ||
*: If line pressure is outside of | ** Main bottle pressure should be at least 5 bar | ||
** Line pressure >1 bar (ALD1) 1-2 bar (ALD2). | |||
*: ''If line pressure is outside of range, carefully adjust the regulator valve with the flow set to 20 sccm.'' | |||
* Make sure the valves of '''all''' precursors inside the ALD machine are closed. | * Make sure the valves of '''all''' precursors inside the ALD machine are closed. | ||
* | * Run recipe ''Default_cleaning'' to pump out any residual gas in the gas lines. | ||
*: With flow set to 0 the actual flow can be between 0-1 sccm. | *: With flow set to 0 the actual flow can be between 0-1 sccm. | ||
* Press the | * Press the '''VENT''' or '''VENT REACTOR''' button. | ||
* Open the metal lid. | * Open the metal lid. | ||
* Put your sample inside, roughly in the center, away from the gas inlet and outlet. | * Put your sample inside, roughly in the center, away from the gas inlet and outlet. | ||
*: Check whether the rubber O-ring is properly seated. | *: Check whether the rubber O-ring is properly seated. | ||
* Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber. | * Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber. | ||
* Press the | * Press the '''PUMP''' or '''PUMP REACTOR''' button. | ||
*: Pressure with flow set to 0: ~5e-2 Torr or lower. | *: Pressure with flow set to 0: ~5e-2 Torr or lower. | ||
* Place the metal cage on top of the tool. | * Place the metal cage on top of the tool. | ||
* Open relevant precursor valves. | * Open relevant precursor valves. | ||
* Run your recipe. | * Run your recipe. | ||
* | <blockquote style="background-color: #F0F0F0; border: dashed thin grey;"> | ||
* | * Pressure with 20 sccm N<sub>2</sub> flow present: low e-1 Torr. | ||
* | * ALD1 pulse lengths: H<sub>2</sub>O ~0.5 s, HfOx TDMAH 0.2 s, AlOx TMA 0.02 s. | ||
* ALD2 pulse lengths: H<sub>2</sub>O ~0.02 s, HfOx TDMAH 0.2-0.5 s. | |||
</blockquote> | |||
* Close precursor valves. | * Close precursor valves. | ||
* Press the big round ''VENT'' or ''VENT REACTOR'' button. | * Press the big round '''VENT''' or '''VENT REACTOR''' button. | ||
* Place the metal cage on the side of the tool. | * Place the metal cage on the side of the tool. | ||
* Take out your sample. Check the rubber o-ring. | * Take out your sample. Check the rubber o-ring. | ||
* Press the big round ''PUMP'' or ''PUMP REACTOR'' button. | * Press the big round '''PUMP''' or '''PUMP REACTOR''' button. | ||
* Close the nitrogen bottle valve on top of the bottle. | * Close the nitrogen bottle valve on top of the bottle. | ||
* Run recipe ''Default_heater_set''. | * Run recipe ''Default_heater_set''. | ||
| Line 67: | Line 94: | ||
== Troubleshooting == | == Troubleshooting == | ||
; Pressure reading obviously wrong (above 1e3 Torr or below 1e-4 Torr): | |||
: Pressure gauge failure. Unplug the network cable from the small square pressure gauge beneath the chamber and plug it back in. The pressure reading should return to expected values. | |||
; No peak visible during precursor pulse: | |||
:* Precursor valves closed. Make sure the relevant precursor valves are open. Consult the labels on the inside of the door. | |||
:* Pulse time too short. Select the lowest plotting interval and check whether you can spot a small peak when the automatic valve opens. Increase pulse time as needed. | |||
; Cannot open lid upon venting: | |||
:* Chamber pressure still below atmosphere. Confirm pressure reading in software. If pressure is below 5e2 Torr, check whether the nitrogen bottle valve is open. | |||
:* Rubber O-ring can get stuck to the lid. Gently but firmly lift the lid. Reseat the O-ring if needed. | |||
; What is the best plot time to graph the process pressure? | |||
: It is recommended to plot only several pulses, for example 30 seconds or 1 minute total plot time. Setting this value to 1 hour during a run can reduce delay precision, because with a 1 hour plot time many data points need to be refreshed, which consumes a lot of processing resources. It is possible to set the plot time to 1 hour to get an overview of pulse heights, but plot times > 5 minutes are not recommended during a run. <ref>Savannah Maintenance Manual</ref> | |||
; What are the recommended heater temperatures? | |||
: These are the recommended temperatures from the manual: | |||
:* Heaters for the trap (#6):150°C | |||
:* Stop valve (#7): 150°C | |||
:* ALD valve oven (#10): 150°C | |||
:* Precursor Manifold: 150°C | |||
:* Reactor heaters (#8 and #9): 100-200°C | |||
:**ALD1 (#8 and #9): 110°C | |||
== Remote access == | |||
* TeamViewer: ALD1, ALD2 | |||
* LogMeIn: ALD1 (CR1), ALD2 (CR2) | |||
[[Category:Tools]] | |||
[[Category:Deposition]] | |||
==References== | |||
Latest revision as of 10:29, 7 January 2025
 | |
| Essentials | |
|---|---|
| Full name | Savannah S100 (gen. 1) |
| Manufacturer | Cambridge NanoTech (Veeco) |
| Description | Atomic layer deposition system |
| Location | Cleanroom 1 (03.2.209A) Cleanroom 2 (03.2.203B) |
| Responsibility | |
| Primary | Harry |
| Secondary | Martin |
Two nearly identical Savannah S100-like systems are used for atomic layer deposition of aluminum oxide and hafnium oxide.
Other material deposition alternatives at the NBI cleanroom:
- AJA systems for sputtering/e-gun evaporation
- E-Gun evaporator
- Edwards thermal evaporator
- Leica sputter coater
- Molecular beam epitaxy system
Growth per cycle (GPC) monitoring
-
ALD1 HfOx -
ALD2 HfOx
Available processes
| Deposited material | Precursor | ALD1 | ALD2 | Ref. |
|---|---|---|---|---|
| Hafnium oxide (HfOx, HfO2) | TDMAH tetrakis(dimethylamino)hafnium [(CH3)2N]4Hf  |
Yes | Yes | [1] |
| Aluminum oxide (AlOx, Al2O3) | TMA trimethylaluminum (CH3)3Al  |
Yes | Yes | [2] |
Standard operating procedure
Video on how to operate ALD 1:
Video on how to operate ALD 2:
- Log the base pressure on the Excel notebook.
- Open valve on top of the nitrogen bottle.
- Check the nitrogen bottle pressure:
- Main bottle pressure should be at least 5 bar
- Line pressure >1 bar (ALD1) 1-2 bar (ALD2).
- If line pressure is outside of range, carefully adjust the regulator valve with the flow set to 20 sccm.
- Make sure the valves of all precursors inside the ALD machine are closed.
- Run recipe Default_cleaning to pump out any residual gas in the gas lines.
- With flow set to 0 the actual flow can be between 0-1 sccm.
- Press the VENT or VENT REACTOR button.
- Open the metal lid.
- Put your sample inside, roughly in the center, away from the gas inlet and outlet.
- Check whether the rubber O-ring is properly seated.
- Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.
- Press the PUMP or PUMP REACTOR button.
- Pressure with flow set to 0: ~5e-2 Torr or lower.
- Place the metal cage on top of the tool.
- Open relevant precursor valves.
- Run your recipe.
- Pressure with 20 sccm N2 flow present: low e-1 Torr.
- ALD1 pulse lengths: H2O ~0.5 s, HfOx TDMAH 0.2 s, AlOx TMA 0.02 s.
- ALD2 pulse lengths: H2O ~0.02 s, HfOx TDMAH 0.2-0.5 s.
- Close precursor valves.
- Press the big round VENT or VENT REACTOR button.
- Place the metal cage on the side of the tool.
- Take out your sample. Check the rubber o-ring.
- Press the big round PUMP or PUMP REACTOR button.
- Close the nitrogen bottle valve on top of the bottle.
- Run recipe Default_heater_set.
Technical notes
- Recipe file location
- ALD1: C:\Savannah\Users\Standard\
- ALD2: C:\Cambridge Nanotech\Recipes\
- Log file location
- ALD1: C:\ALD data. Includes pressure data, screenshot at termination.
- ALD2: C:\Cambridge Nanotech\Log\. Includes pressure and heater temperature data, screenshot at termination, software event logs.
Troubleshooting
- Pressure reading obviously wrong (above 1e3 Torr or below 1e-4 Torr)
- Pressure gauge failure. Unplug the network cable from the small square pressure gauge beneath the chamber and plug it back in. The pressure reading should return to expected values.
- No peak visible during precursor pulse
-
- Precursor valves closed. Make sure the relevant precursor valves are open. Consult the labels on the inside of the door.
- Pulse time too short. Select the lowest plotting interval and check whether you can spot a small peak when the automatic valve opens. Increase pulse time as needed.
- Cannot open lid upon venting
-
- Chamber pressure still below atmosphere. Confirm pressure reading in software. If pressure is below 5e2 Torr, check whether the nitrogen bottle valve is open.
- Rubber O-ring can get stuck to the lid. Gently but firmly lift the lid. Reseat the O-ring if needed.
- What is the best plot time to graph the process pressure?
- It is recommended to plot only several pulses, for example 30 seconds or 1 minute total plot time. Setting this value to 1 hour during a run can reduce delay precision, because with a 1 hour plot time many data points need to be refreshed, which consumes a lot of processing resources. It is possible to set the plot time to 1 hour to get an overview of pulse heights, but plot times > 5 minutes are not recommended during a run. [1]
- What are the recommended heater temperatures?
- These are the recommended temperatures from the manual:
- Heaters for the trap (#6):150°C
- Stop valve (#7): 150°C
- ALD valve oven (#10): 150°C
- Precursor Manifold: 150°C
- Reactor heaters (#8 and #9): 100-200°C
- ALD1 (#8 and #9): 110°C
Remote access
- TeamViewer: ALD1, ALD2
- LogMeIn: ALD1 (CR1), ALD2 (CR2)
References
- ↑ Savannah Maintenance Manual