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10 September 2026
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N 16:02 | Working with Piranha 2 changes history +1,651 [Harry (2×)] | |||
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16:02 (cur | prev) −4 Harry talk contribs (→Mixing KOH pellets and etching) | ||||
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16:02 (cur | prev) +1,655 Harry talk contribs (Created page with "==Mixing KOH pellets and etching== <div style="background-color: #c0c0c0; border: 1px solid #00000; padding: 10px; border-radius: 5px;"> * Book the HF fumehood in CR1. : ''It is recommended to use a setup where you can run your process undisturbed'' * Gather all necessary glassware: ** two PTFE (Teflon) beakers * Gather all necessary chemicals: ** Concentrated sulfuric acid ** Hydrogen peroxide * Turn on MQ 30-minute timer. Flush the MQ for 30 seconds * Make sure you hav...") | |||
| 12:16 | HF safety diffhist −110 Harry talk contribs (→Chemical and Toxicological Properties) | ||||
9 September 2026
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N 15:49 | Working with KOH 4 changes history +2,183 [Harry (4×)] | |||
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15:49 (cur | prev) +1,319 Harry talk contribs | ||||
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14:52 (cur | prev) +177 Harry talk contribs | ||||
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14:49 (cur | prev) +121 Harry talk contribs | ||||
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14:43 (cur | prev) +566 Harry talk contribs (Created page with "KOH belongs to the family of anisotropic Si-etchants based on aqueous alkaline solutions. The anisotropy stems from the different etch rates in different crystal directions. The {111}-planes are almost inert whereas the etch rates of e.g. {100}- and {110}-planes are several orders of magnitude faster. At NBI cleanroom, we use as standard a 28 wt% KOH solution. The etch rate and the selectivity towards a SiO2 mask depends on the temperature. We normally use a temperature...") | |||
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15:22 | HF safety 2 changes history −42 [Harry (2×)] | |||
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15:22 (cur | prev) +30 Harry talk contribs (→Before Starting) | ||||
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15:01 (cur | prev) −72 Harry talk contribs | ||||