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16:0216:02, 10 September 2026 Working with Piranha (hist | edit) [1,651 bytes] Harry (talk | contribs) (Created page with "==Mixing KOH pellets and etching== <div style="background-color: #c0c0c0; border: 1px solid #00000; padding: 10px; border-radius: 5px;"> * Book the HF fumehood in CR1. : ''It is recommended to use a setup where you can run your process undisturbed'' * Gather all necessary glassware: ** two PTFE (Teflon) beakers * Gather all necessary chemicals: ** Concentrated sulfuric acid ** Hydrogen peroxide * Turn on MQ 30-minute timer. Flush the MQ for 30 seconds * Make sure you hav...")

14:4314:43, 9 September 2026 Working with KOH (hist | edit) [6,964 bytes] Harry (talk | contribs) (Created page with "KOH belongs to the family of anisotropic Si-etchants based on aqueous alkaline solutions. The anisotropy stems from the different etch rates in different crystal directions. The {111}-planes are almost inert whereas the etch rates of e.g. {100}- and {110}-planes are several orders of magnitude faster. At NBI cleanroom, we use as standard a 28 wt% KOH solution. The etch rate and the selectivity towards a SiO2 mask depends on the temperature. We normally use a temperature...")

15:2315:23, 13 August 2026 Knowledge database for ALD (hist | edit) [121 bytes] Harry (talk | contribs) (Created page with "=ALD1= ==TMA (Al2O3)== ==TDMAHf (HfO2)== ==TTIP (TiO2)== =ALD2= ==TMA (Al2O3)== ==TDMAHf (HfO2)== ==TDMAZr (ZrO2)==")

11:3811:38, 5 August 2026 AJA gallery (hist | edit) [40 bytes] Harry (talk | contribs) (Created page with "=AJA1= =AJA2=")

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