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9 September 2025
- 09:1909:19, 9 September 2025 Probe station (hist | edit) [653 bytes] Harry (talk | contribs) (Created page with "In Qdev/ NBI cleanroom there are two probe stations for electrical characterisation. One on the 1st floor 03-1-111 (next to Qdev lounge) and one on the basement 03-K-08A (characterisation room with SEM and AFM). * '''1st floor probe station''': 2 probes and a Sysdey motherboard with 96 DC lines. It is connected to a He compressor, giving the possibility to reach down to ~4 K. * '''Basement probe station''': 6 probes and a pump cart connected to the chamber. Both tools...")
8 September 2025
- 14:2614:26, 8 September 2025 K&S bonder (hist | edit) [465 bytes] Harry (talk | contribs) (Created page with "{{Infobox tool |image = Tools KS bonder.jpg |toolfullname = K&S Inseto MPP 4523 |serial number = 610337 |website = https://www.https://www.inseto.com/ |company = inseto |description = Manual Fine Wire Bonder |location = 2nd floor lab (03.2.213) |primary = Harry |secondary = Nader }} K&S Bonder MPP 4523 is a manual bonder. It belongs to the 4500 Series Manual Fine Wire Bonder of inseto. Users typically use it to bond III/Vs with a Au wire to PCB daughterboards.")
- 13:5313:53, 8 September 2025 Adhesion promoter AR 300-80 NEW (hist | edit) [1,039 bytes] Harry (talk | contribs) (Created page with "We stock AR 300-80 adhesion promoter in the cleanroom, which is recommended if you have delamination issues. The promoter works with Si (SiO2) and other III-V semiconductors. We've tested it on GaSb with very nice results. * AR 300-80 info sheet. * Material safety data sheet. Recommended processing instructions: * Spin coat a clean chip with the adhesion promoter at 4000 rpm for 45-60 s. The manufacturer states...")
- 12:3212:32, 8 September 2025 Ga removal from backside of GaAs wafers (hist | edit) [3,281 bytes] Harry (talk | contribs) (Created page with "When receiving GaAs wafers, they often come with a layer of gallium on the backside. This layer has turned out to cause quite some troubles, as it introduces an uneven surface on the backside of the wafers. The rough gallium on the backside tends to give high sample inclination and makes it difficult to handle small samples. You can request the growers to remove this Ga layer before shipping. Meanwhile, you need to remove the Ga from the wafers. =Techniques from John W...")
- 10:0510:05, 8 September 2025 Preparation of solutions (hist | edit) [1,007 bytes] Harry (talk | contribs) (Created page with "=1M Citric acid solution= #Citric acid in powder form is kept in the cleanroom hallway. #Citric acid is solution is kept in dedicated bottles in CR1 cupboard(by the spin coater) ==Preparation of the bottle== # Clean the bottle with MQ water, multiple times # Take 1L MQ water in this bottle # Keep the bottle on Hot plate @ 85deg # Keep magnetic stirrer running # Take 193gm of Citric acid powder by using weighing balance accurately. (This is very important to weigh accura...")
- 10:0010:00, 8 September 2025 AR-P 6200 (CSAR) (hist | edit) [1,516 bytes] Harry (talk | contribs) (Created page with "Some users are experimenting with AR-P 6200 (CSAR 62) from ALLRESIST GmbH as an alternative to ZEP resists. This page contains information on the resist and the process recommended by Shiv. Documents from the supplier: * AR-P 6200 (CSAR 62) info sheet. * Material safety data sheet. We have the following resist solution stocked in the cleanroom: {| class="wikitable" |+CSAR attributes |- |'''CSAR dilutions''' |''...")
- 09:4909:49, 8 September 2025 Wafers (hist | edit) [867 bytes] Harry (talk | contribs) (Created page with "You can email cleanroom@nbi.ku.dk to request chips or wafers. In the case that you want to use multiple wafers, you will have to purchase wafers via your own grant. You can store the wafers in the cleanroom as your own property. Please remember to label them clearly. =Silicon wafers= In the cleanroom we have available: ==Bare Si== * Si(001) 1" wafers * Si(001) 2" wafers * Si(001) 4" wafers (boron doped) * Si(111) 6" wafers (instrinsic) ==Si with CVD SiOx== * Si(001...")
3 September 2025
- 13:0013:00, 3 September 2025 Cleaning (hist | edit) [244 bytes] Harry (talk | contribs) (Created page with "=Cleaning recipe= It is recommended to use the following recipe to clean the surface of your sample: * '''1,3-dioxolane''' 3 mins * '''Acetone''' 2 mins * '''IPA''' 1 min * '''Blow dry with N2 gun''' 30 sec * '''Oxygen plasma ashing''' 2 mins")
- 12:5812:58, 3 September 2025 Clean your sample (hist | edit) [244 bytes] Harry (talk | contribs) (Created page with "=Cleaning recipe= It is recommended to use the following recipe to clean the surface of your sample: * '''1,3-dioxolane''' 3 mins * '''Acetone''' 2 mins * '''IPA''' 1 min * '''Blow dry with N2 gun''' 30 sec * '''Oxygen plasma ashing''' 2 mins")
- 12:3412:34, 3 September 2025 Phidl (hist | edit) [1,048 bytes] Harry (talk | contribs) (Created page with "Phidl is a parametric design library implemented in Python, which allows you to code your designs. This can be particularly useful in designs, that are meant to be parametrically extended in some way. Even if this is not the case, after you build the design, it is particularly easy to manipulate parameters, without having to do it manually. More information can be found by reading the [https://phidl.readthedocs.io/en/latest/ documentation] and on the [https://pypi.org/...")
- 12:3212:32, 3 September 2025 Clewin (hist | edit) [348 bytes] Harry (talk | contribs) (Created page with "=Installation= Clewin runs only on Windows *Go to N-drive/installation files/Clewin install *You need to install version 5 first, followed by the 64 bit setup file *Run the new 5.3 Clewin and update from within the software (Help -> Check for updates) *You can uninstall the older v 5.0 Clewin at this point to avoid confusion with the new version.")
- 11:4011:40, 3 September 2025 Design software (hist | edit) [2,387 bytes] Harry (talk | contribs) (Created page with "There is a number of common computers at QDev/NBI cleanroom for shared use. Please be mindful that a lot of other people want to use them. So, always book before starting to use a PC. Clean up after yourself -- do not leave windows open and programs running once you are done. Do not use flash drives or other removable media. Use N-Drive instead. = Design PCs = There are 4 PCs dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8. They a...")
- 11:1911:19, 3 September 2025 Booking Calendar (hist | edit) [4,297 bytes] Harry (talk | contribs) (Created page with "Booked Scheduler is the [https://cleanroom.brickhost.com/ booking system] at QDev and [https://wiki.nbi.ku.dk/cleanroom NBI cleanroom] for reserving common resources such as cleanroom tools or design PCs. It is hosted remotely, with the backend fully managed by the developer. Cleanroom staff is responsible for maintaining it at QDev/NBI. == Status == There are two web monitors set up to track the status of the website: * [https://statuspage.freshping.io/45217-Cleanroom...")
- 11:1511:15, 3 September 2025 Cleanroom PCs (hist | edit) [1,354 bytes] Harry (talk | contribs) (Created page with "There is a number of PCs connected to cleanroom tools. Cleanroom staff is responsible for those. They are used to control fabrication related systems and/or transfer data between them and N-drive. Do not use flash drives or other removable media. = Requests for remote access = All the requests are handled via the KUIT webpage. Log in with your credentials at the following webpage [https://identity.ku.dk identity.ku.dk]. * Click on <code> Manage user access</code> *...")
- 10:0410:04, 3 September 2025 Design software and PCs (hist | edit) [2,395 bytes] Harry (talk | contribs) (Created page with "There is a number of common computers at QDev/NBI cleanroom for shared use. Please be mindful that a lot of other people want to use them. So, always book before starting to use a PC. Clean up after yourself -- do not leave windows open and programs running once you are done. Do not use flash drives or other removable media. Use N-Drive instead. = Design PCs = There are 4 PCs dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8. They a...")
19 August 2025
- 09:5909:59, 19 August 2025 Sustainability (hist | edit) [2,566 bytes] Harry (talk | contribs) (Created page with "Sustainability in a cleanroom is a difficult challenge. However, there's no time to waste – the best time to act is now. Our planet's health depends on it. In the cleanroom of the University of Copenhagen, we have already taken steps to reduce our day-to-day waste, and we are always active in discussing means to become more sustainable. We are always open to suggestions to decrease our environmental impact. =User's responsibility= * Reduce the amount of single-use m...")
6 August 2025
- 12:1512:15, 6 August 2025 SU-8 (hist | edit) [2,018 bytes] Harry (talk | contribs) (Created page with "SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical...")