Recommended parameters for EBL: Difference between revisions

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The '''pixel size''' should be equal to the '''beam spot size'''  
The '''pixel size''' should be roughly equal to the '''beam spot size'''  
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* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page
* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page

Revision as of 08:40, 9 April 2026

Cleanroom recommendations

125 kV
Field Size (µm) Dots Pitch Pixel size (nm) Aperture (µm) Beam current (A) Beam spot (nm)
500 50000 8 80 240 60e-9 83.3
500 1000000 5 2.5 60 1e-9 2.6
100 kV
Field Size (µm) Dots Pitch Pixel size (nm) Aperture (µm) Beam current (A) Beam spot (nm)
600 20000 7 210 250 20e-9 218.6
600 240000 1 2.5 40 500e-12 2.7

How to choose the correct parameters yourself

A good place to start is the Unofficial dose calculator

  • Choose the EBL tool (100 or 125 keV)
  • Write field size (µm) and Dots: The combination of these two will give you the pixel size for a default pitch of 1.
    • It is recommended to use high number of dots with a pitch multiplier for fine exposures
  • Aperture and Beam current: The combination of these two will give you the beam spot size

The pixel size should be roughly equal to the beam spot size

  • Area dose: The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the Doses page