Laurell spinners: Difference between revisions
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added short description and usage rules |
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There are chucks to accommodate small pieces. | There are chucks to accommodate small pieces. | ||
Let the [[About|cleanroom staff] know if the chuck or the o-ring is damaged. | Let the [[About|cleanroom staff]] know if the chuck or the o-ring is damaged. | ||
There should be some spares in the drawers in Cleanroom 1. | There should be some spares in the drawers in Cleanroom 1. | ||
Revision as of 19:06, 10 April 2022
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| Essentials | |
|---|---|
| Full name | Laurell WS-650MZ-23NPP/LITE |
| Manufacturer | Laurell Technologies Corp. |
| Description | Spin coater |
| Location | Cleanroom 1 (03.2.209A) Cleanroom 2 (03.2.203B) |
| Responsibility | |
| Primary | Nader |
Used to spin photo- and e-beam resist on substrates for either exposure in one of the lithography tools, or as a protective layer for e.g. dicing.
There are chucks to accommodate small pieces. Let the cleanroom staff know if the chuck or the o-ring is damaged. There should be some spares in the drawers in Cleanroom 1.
There is also a special fork to center 2" wafers; look for it on the right side of the laminar air flow bench.
Usage rules
The users are obliged to clean up after themselves! First use a dry wipe to collect most of the resist on the inside walls, then use one or two with acetone to clean the inside surfaces thoroughly.
LOR3B is not allowed in the spinner in Cleanroom 1.