Recommended parameters for EBL: Difference between revisions
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''This section needs additional data'' | |||
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|+[[Elionix F-125|125 kV]] | |+[[Elionix F-125|125 kV]] | ||
Latest revision as of 08:45, 9 April 2026
Cleanroom recommendations
This section needs additional data
| Field Size (µm) | Dots | Pitch | Pixel size (nm) | Aperture (µm) | Beam current (A) | Beam spot (nm) |
| 500 | 50000 | 8 | 80 | 240 | 60e-9 | 83.3 |
| 500 | 1000000 | 5 | 2.5 | 60 | 1e-9 | 2.6 |
| Field Size (µm) | Dots | Pitch | Pixel size (nm) | Aperture (µm) | Beam current (A) | Beam spot (nm) |
| 600 | 20000 | 7 | 210 | 250 | 20e-9 | 218.6 |
| 600 | 240000 | 1 | 2.5 | 40 | 500e-12 | 2.7 |
How to choose the correct parameters yourself
A good place to start is the Unofficial dose calculator
- Choose the EBL tool (100 or 125 keV)
- Write field size (µm) and Dots: The combination of these two will give you the pixel size for a default pitch of 1.
- It is recommended to use high number of dots with a pitch multiplier for fine exposures
- Aperture and Beam current: The combination of these two will give you the beam spot size
The pixel size should be roughly equal to the beam spot size
- Area dose: The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the Doses page