Laurell spinners: Difference between revisions
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{{Infobox tool | {{Infobox tool | ||
|image = Tool Laurell spinner.jpg | |image = Tool Laurell spinner.jpg | ||
|toolfullname = | |toolfullname = Laurell WS-650MZ-23NPP/LITE | ||
|website = | |website = https://www.laurell.com/spin-coater/?model=WS-650-23 | ||
|company = | |company = Laurell Technologies Corp. | ||
|description = | |description = Spin coater | ||
|location = | |location = Cleanroom 1 (03.2.209A)<br />Cleanroom 2 (03.2.203B) | ||
|primary = | |primary = Nader | ||
}} | }} | ||
Used to spin photo- and e-beam [[Resists|resist]] on substrates for either exposure in one of the lithography [[Tools|tools]], or as a protective layer for e.g. [[Dicing saw|dicing]]. | |||
There are chucks to accommodate small pieces. | |||
Let the [[About|cleanroom staff]] know if the chuck or the o-ring is damaged. | |||
There should be some spares in the drawers in Cleanroom 1. | |||
There is also a special fork to center 2" wafers; look for it inside the fumehood of CR1 spinner. | |||
== Usage rules == | |||
The users are obliged to clean up after themselves! First use a dry wipe to collect most of the resist on the inside walls, then use more with acetone or 1,3 dioxolane to clean the inside surfaces thoroughly. | |||
LOR3B is only allowed in the spinner in Cleanroom 1. | |||
[[Category:Tools]] | |||
[[Category:Deposition]] | |||
Latest revision as of 11:00, 20 December 2024
 | |
| Essentials | |
|---|---|
| Full name | Laurell WS-650MZ-23NPP/LITE |
| Manufacturer | Laurell Technologies Corp. |
| Description | Spin coater |
| Location | Cleanroom 1 (03.2.209A) Cleanroom 2 (03.2.203B) |
| Responsibility | |
| Primary | Nader |
Used to spin photo- and e-beam resist on substrates for either exposure in one of the lithography tools, or as a protective layer for e.g. dicing.
There are chucks to accommodate small pieces. Let the cleanroom staff know if the chuck or the o-ring is damaged. There should be some spares in the drawers in Cleanroom 1.
There is also a special fork to center 2" wafers; look for it inside the fumehood of CR1 spinner.
Usage rules
The users are obliged to clean up after themselves! First use a dry wipe to collect most of the resist on the inside walls, then use more with acetone or 1,3 dioxolane to clean the inside surfaces thoroughly.
LOR3B is only allowed in the spinner in Cleanroom 1.