Tergeo plasma asher

Tergeo plasma asher
Essentials
Full name	Tergeo Plasma Cleaner
Manufacturer	PIE Scientific
Description	Plasma cleaning/etching system
Location	Cleanroom 2 (03.2.203B)
Manual	Manufacturer quick start guide
Responsibility
Primary	Nader
Secondary	Martin

The Tergeo plasma asher is used for two main purposes, surface activation and decontamination.

Some cleanroom users use the asher before spinning resist because oxygen plasma increases the substrate surface energy, which increases surface wettability.

The asher is also used after developing resist in order to ash away any small residues left in the developed substrate areas. This process is also known as descumming.

At higher process power and/or longer plasma time the asher can ash away all organic materials, such as photo- or e-beam resist.

In cleanroom 1 there is a Diener plasma asher.

There is a Plasma-Preen asher outside of the cleanroom in the 2nd floor lab.

Usage rules

This tool is for semiconductors only. This means no daughterboards, beakers, tweezers, etc.

Make sure your samples are absolutely 100% dry before putting them in the asher.

Quick-start guide

Video on how to operate the Tergeo Plasma Asher:

Click here to watch the video on YouTube

Load your sample

Turn the lid counter-clockwise to remove it. Place it outside-up on a cleanroom wipe.
Slide out quartz plate.
Put your sample in the center between the marks.
Slide the plate in and align it to the quartz cylinder.
Put the lid back.
- Align the pins horizontally and rotate clockwise.

Execute a cleaning recipe

On the touchscreen, using the stylus, press Recipes.
Choose a desired plasma time.
Load Recipe
Run Recipe
Wait for recipe to complete and the system to indicate that the chamber has been vented.

Unload your sample

Remove the lid and place it on a cleanroom wipe.
Slide out plate.
Remove your sample.
Slide the plate in.
Put the lid back.
Check on the screen that the pump is off (grey).
- If it is on (red), press to turn off.
Done!