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• 14:43, 9 September 2026 Harry talk contribs created page Working with KOH (Created page with "KOH belongs to the family of anisotropic Si-etchants based on aqueous alkaline solutions. The anisotropy stems from the different etch rates in different crystal directions. The {111}-planes are almost inert whereas the etch rates of e.g. {100}- and {110}-planes are several orders of magnitude faster. At NBI cleanroom, we use as standard a 28 wt% KOH solution. The etch rate and the selectivity towards a SiO2 mask depends on the temperature. We normally use a temperature...")