Plassys Evaporator

Overview

Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Film Quality : AFM Analysis for surface roughness is 1.6 nm for 100nm thickness film ( scan area 2 um)

Currently loaded materials

Crucible position Material Comment 1 Ti Plassys ( currently In Use) 2 Al Plassys ( Material consumed) 3 Al Melted. Currently In Use 4 Al new pellets. Not melted Substrates allowed Silicon and Sapphire only