Plassys Evaporator

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Revision as of 13:24, 23 May 2023 by Zhe (talk | contribs) (Overview)
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Overview

Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Currently loaded materials

The materials currently available for deposition are :

AJA1 Material Liner
1 Al Intermetallic
2 Ti1 Fabmate
3 Au1 Tungsten
4 Au2 Tungsten
5 Ti2 Fabmate
6 SiO2 FabMate
DC1 W --
DC2 NbTi --

AJA2 Material Liner
1 Au Tungsten
2 Titanium FabMate
3 Al Intermetallic
4 Pd intermetallic
5 Ge FabMate
6 Pt FabMate
DC1 ReMo --
RF2 NbTi --