Plassys Evaporator

Overview

Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)

Currently loaded materials

Crucible position	Material	Comment
1	Ti	Currently In Use
2	-	Empty
3	-	Empty
4	Al	NBI crucible
5	Al	NQCP crucible

Substrates allowed

Silicon and Sapphire only