Plassys Evaporator
Overview
Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.
It also provides an ion gun for surface preparation and etching purposes.
The system has the capability of in-situ oxidation.
The sample stage can be cooled with LN2.
Film Quality: Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)
Currently loaded materials
| Crucible position | Material | Comment |
|---|---|---|
| 1 | Ti | Currently In Use |
| 2 | - | Empty |
| 3 | - | Empty |
| 4 | Al | NBI crucible |
| 5 | Al | NQCP crucible |
Substrates allowed
Silicon and Sapphire only