Cambridge ALD
 | |
| Essentials | |
|---|---|
| Full name | Savannah S100 (gen. 1) |
| Manufacturer | Cambridge NanoTech (Veeco) |
| Description | Atomic layer deposition system |
| Location | Cleanrooms 1 & 2 |
| Manual | TBD |
| Responsibility | |
| Primary | Shiv |
| Secondary | Pétur |
Available processes
| Deposited material | Precursor | ALD1 | ALD2 | Ref. |
|---|---|---|---|---|
| Hafnium oxide (HfOx, HfO2) | TEMAH tetrakis(ethylmethylamino)hafnium [(CH3)(C2H5)N]4Hf  |
Yes | Yes | [1] |
| Aluminum oxide (AlOx, Al2O3) | TMA trimethylaluminum (CH3)3Al  |
Yes | No | [2] |