Plassys Evaporator: Difference between revisions

From cleanroom
Jump to navigation Jump to search
← Older editNewer edit →
Zhe (talk | contribs)
56 edits
Zhe (talk | contribs)
56 edits
Line 5: Line 5:


== Currently loaded materials ==
== Currently loaded materials ==
The materials currently available for deposition are :
Ti ( crucible 1 ) and Al ( crucible 2)


{|
{|

Revision as of 09:07, 20 June 2023

Overview

Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Currently loaded materials

Crucible position Material Comment
1 Ti Plassys ( currently In Use)
2 Al Plassys ( Material consumed)
3 Al Melted. Currently In Use
4 Al new pellets. Not melted

Substrates allowed

Silicon and Sapphire only

Retrieved from "https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Plassys_Evaporator&oldid=2249"