Plassys Evaporator: Difference between revisions
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The materials currently available for deposition are : | The materials currently available for deposition are : | ||
Ti ( crucible 1 ) and Al ( crucible 2) | Ti ( crucible 1 ) and Al ( crucible 2) | ||
{| | |||
|- | |||
| | |||
{| class="wikitable" | |||
|- | |||
! Crucible position | |||
! Material | |||
! Comment | |||
|- | |||
| 1 | |||
| Ti | |||
| Plassys ( currently In Use) | |||
|- | |||
| 2 | |||
| Al | |||
| Plassys ( Material consumed) | |||
|- | |||
| 3 | |||
| Al | |||
| Melted. Currently In Use | |||
|- | |||
| 4 | |||
| Al | |||
| new pellets. Not melted | |||
|} | |||
== Substrates allowed == | == Substrates allowed == | ||
Silicon and Sapphire only | Silicon and Sapphire only | ||
Revision as of 09:07, 20 June 2023
Overview
Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .
Currently loaded materials
The materials currently available for deposition are : Ti ( crucible 1 ) and Al ( crucible 2)
Substrates allowedSilicon and Sapphire only |