Plassys Evaporator: Difference between revisions
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Created page with "== Overview == Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system..." |
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Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. | Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. | ||
The system has the capability of in-situ oxidation . | The system has the capability of in-situ oxidation . | ||
== Currently loaded materials == | |||
The materials currently available for deposition are : | |||
{| | |||
|- | |||
| | |||
{| class="wikitable" | |||
|- | |||
! AJA1 | |||
! Material | |||
! Liner | |||
|- | |||
| 1 | |||
| Al | |||
| Intermetallic | |||
|- | |||
| 2 | |||
| Ti1 | |||
| Fabmate | |||
|- | |||
| 3 | |||
| Au1 | |||
| Tungsten | |||
|- | |||
| 4 | |||
| Au2 | |||
| Tungsten | |||
|- | |||
| 5 | |||
| Ti2 | |||
| Fabmate | |||
|- | |||
| 6 | |||
| SiO2 | |||
| FabMate | |||
|- | |||
| DC1 | |||
| W | |||
| -- | |||
|- | |||
| DC2 | |||
| NbTi | |||
| -- | |||
|- | |||
|} | |||
| | |||
<span style="display:inline-block; width: 20px;"></span> | |||
| | |||
{| class="wikitable" | |||
|- | |||
! AJA2 | |||
! Material | |||
! Liner | |||
|- | |||
| 1 | |||
| Au | |||
| Tungsten | |||
|- | |||
| 2 | |||
| Titanium | |||
| FabMate | |||
|- | |||
| 3 | |||
| Al | |||
| Intermetallic | |||
|- | |||
| 4 | |||
| Pd | |||
| intermetallic | |||
|- | |||
| 5 | |||
| Ge | |||
| FabMate | |||
|- | |||
| 6 | |||
| Pt | |||
| FabMate | |||
|- | |||
| DC1 | |||
| ReMo | |||
| -- | |||
|- | |||
| RF2 | |||
| NbTi | |||
| -- | |||
|- | |||
|} | |||
|- | |||
|} | |||
Revision as of 13:24, 23 May 2023
Overview
Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .
Currently loaded materials
The materials currently available for deposition are :
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