Tools: Difference between revisions

Revision as of 22:31, 14 February 2016

Lithography	Thin film processing	Characterization	Other
e-Line Litho Elionix Raith eLine Heidelberg µUPG 501 Süss mask aligner	AJA systems E-Gun evaporator Spinners ALD 1 ALD 2 DC sputter MBE	JEOL JSM 6320F JEOL JSM 7800F e-Line SEM TEM Alphastep Optical profiler Optical microscopes AFM	Scriber Süss Scriber Loomis RTP Biorad oven µ-wave plasma oven Denier RF-asher K&S Ball Bonder Edwards evaporator

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 ! Lithography !! Thin film processing !! Characterization !! Other
 |- valign="top"
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 * e-Line Litho
 * Elionix
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 * Heidelberg µUPG 501
 * Süss mask aligner
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 * AJA systems
 * E-Gun evaporator
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 * DC sputter
 * MBE
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+| style="width: 20%;" |
 * JEOL JSM 6320F
 * JEOL JSM 7800F
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 * Optical microscopes
 * AFM
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+| style="width: 20%;" |
 * Scriber Süss
 * Scriber Loomis