Cambridge ALD: Difference between revisions

Cambridge ALD
Essentials
Full name	Savannah S100 (gen. 1)
Manufacturer	Cambridge NanoTech (Veeco)
Description	Atomic layer deposition system
Location	Cleanrooms 1 & 2
Manual	TBD
Responsibility
Primary	Shiv
Secondary	Pétur

Revision as of 12:38, 12 February 2019

Deposited material	Precursor	ALD1	ALD2	Ref.
Hafnium oxide (HfOx, HfO₂)	TEMAH tetrakis(ethylmethylamino)hafnium [(CH₃)(C₂H₅)N]₄Hf	Yes	Yes	[1]
Aluminum oxide (AlOx, Al₂O₃)	TMA trimethylaluminum (CH₃)₃Al	Yes	No	[2]

@@ Line 1: / Line 1: @@
 {{Infobox tool
 |image = Tool ALD.jpg
-|toolfullname =
+|toolfullname = Savannah S100 (gen. 1)
-|website = http://www.cambridgenanotechald.com/
+|website = http://www.cambridgenanotechald.com/products/Savannah-ald-system.shtml
-|company = Cambridge NanoTech Inc
+|company = Cambridge NanoTech (Veeco)
 |description = Atomic layer deposition system
 |location = Cleanrooms 1 & 2
@@ Line 12: / Line 12: @@
 |manual = TBD
 }}
+== Available processes ==
+{| class="wikitable"
+|-
+! Deposited material !! Precursor !! ALD1 !! ALD2 !! Ref.
+|-
+| Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TEMAH <div class="mw-collapsible-content">tetrakis(ethylmethylamino)hafnium <br/> [(CH<sub>3</sub>)(C<sub>2</sub>H<sub>5</sub>)N]<sub>4</sub>Hf <br/> [[File:TEMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [http://jes.ecsdl.org/content/151/8/F189]
+|-
+| Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #ff9f9f" | No || [https://link.springer.com/article/10.1134%2F1.1626763]
+|}