Raith eLine: Difference between revisions

From cleanroom
Jump to navigation Jump to search
No edit summary
No edit summary
Line 1: Line 1:
{{Infobox
{{Infobox tool
|image = Tool eline.jpg
|image = Tool eline.jpg
|toolfullname = Raith e-Line
|toolfullname = Raith e-Line

Revision as of 21:46, 2 December 2016

Raith eLine
Picture of Raith eLine text
Essentials
Full nameRaith e-Line
ManufacturerRaith Nanofabrication
DescriptionElectron beam lithography and microscopy system
LocationTBD
ManualTBD
Responsibility
PrimaryShiv
SecondaryNader

eLine usage and reservation guidelines

  • To book time on the machine go to [1]. You should sign in in the booking system, even if the machine is available and not booked by others.
  • Late cancellations of sessions that you’ve signed up should only happen when unforeseen conflicts or unexpected fab difficulties occur. Please do not sign up to use equipment unless you are prepared and have every intention of using the time.

If you don't have an account write to the cleanroom staff (cleanroom[at]nbi[dot]dk) and we will provide you with username and password.

  • Use the dedicated SEM (JEOL) for microscopy, unless the e_Line is really needed. Ask for SEM training if needed.
  • Between the hours of 9 am and 6 pm on weekdays, you should:
    • not reserve more than 3 hours. See (*)
    • not book a 2nd slot, before the 1st one is done. See (*)
    • delete booking only before the starting time.
    • write to the experiment mailing list that the machine is free, if you finish earlier.

(*) Some NW wafer exposures take longer and exceptions to these rules are made to accomodate these tasks. A special account NW-MBE is used in the booking system to indicate these jobs.

  • Please talk to a staff member if you have fab jobs that are not compatible with the rules above