Plassys Evaporator: Difference between revisions
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= Overview = | |||
Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication. | Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication. | ||
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Film Quality: ''Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)'' | Film Quality: ''Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)'' | ||
= Currently loaded materials = | |||
{| class="wikitable" | {| class="wikitable" | ||
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|} | |} | ||
= Substrates allowed = | |||
* Silicon and Sapphire only | |||
* III/V substrates are not allowed in the chamber | |||
= Standard Operating Procedure= | |||
This is the standard operating procedure for the Plassys evaporator at the process lab on the second floor. | |||
==Pre-checks and log in== | |||
===Pre-checks=== | |||
# Log the loadlock and main chamber pressures in the Excel log sheet at the external computer. | |||
#* P<sub>LL</sub> ~ 1e-7 bar | |||
#* P<sub>main</sub> < 5e-8 bar | |||
# Verify that the turbopump and the cryopump are both running (check main software interface) | |||
#* Turbo should be running on 100% speed | |||
#* T<sub>cryo</sub> should be in the range 12-15 K | |||
# Verify that nobody has loaded a sample and that no user is logged on | |||
===Log in=== | |||
* Click on the <code>logged off</code> indication of the GUI and use your group's credentials to log in | |||
==Sample loading== | |||
==Load your recipe== | |||
==Excecute your recipe== | |||
==Monitor your process== | |||
==Sample unloading== | |||
Revision as of 12:36, 9 September 2025
Overview
Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.
It also provides an ion gun for surface preparation and etching purposes.
The system has the capability of in-situ oxidation.
The sample stage can be cooled with LN2.
Film Quality: Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)
Currently loaded materials
| Crucible position | Material | Comment |
|---|---|---|
| 1 | Ti | Currently In Use |
| 2 | - | Empty |
| 3 | - | Empty |
| 4 | Al | NBI crucible |
| 5 | Al | NQCP crucible |
Substrates allowed
- Silicon and Sapphire only
- III/V substrates are not allowed in the chamber
Standard Operating Procedure
This is the standard operating procedure for the Plassys evaporator at the process lab on the second floor.
Pre-checks and log in
Pre-checks
- Log the loadlock and main chamber pressures in the Excel log sheet at the external computer.
- PLL ~ 1e-7 bar
- Pmain < 5e-8 bar
- Verify that the turbopump and the cryopump are both running (check main software interface)
- Turbo should be running on 100% speed
- Tcryo should be in the range 12-15 K
- Verify that nobody has loaded a sample and that no user is logged on
Log in
- Click on the
logged offindication of the GUI and use your group's credentials to log in