Plassys Evaporator: Difference between revisions
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== Overview == | == Overview == | ||
Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication. | |||
It also provides an ion gun for surface preparation and etching purposes. | It also provides an ion gun for surface preparation and etching purposes. | ||
Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023) | The system has the capability of in-situ oxidation. | ||
The sample stage can be cooled with LN2. | |||
Film Quality: ''Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)'' | |||
== Currently loaded materials == | == Currently loaded materials == | ||
Revision as of 12:14, 9 September 2025
Overview
Physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.
It also provides an ion gun for surface preparation and etching purposes.
The system has the capability of in-situ oxidation.
The sample stage can be cooled with LN2.
Film Quality: Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis (June 2023)
Currently loaded materials
| Crucible position | Material | Comment |
|---|---|---|
| 1 | Ti | Currently In Use |
| 2 | - | Empty |
| 3 | - | Empty |
| 4 | Al | NBI crucible |
| 5 | Al | NQCP crucible |
Substrates allowed
Silicon and Sapphire only