Plassys Evaporator: Difference between revisions

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The materials currently available for deposition are :
The materials currently available for deposition are :
 
Ti ( crucible 1 ) and Al ( crucible 2
{|
|-
|
{| class="wikitable"
|-
! AJA1
! Material
! Liner
|-
| 1
| Al
| Intermetallic
|-
| 2
| Ti1
| Fabmate
|-
| 3
| Au1
| Tungsten
|-
| 4
| Au2
| Tungsten
|-
| 5
| Ti2
| Fabmate
|-
| 6
| SiO2
| FabMate
|-
| DC1
| W
| --
|-
| DC2
| NbTi
| --
|-
|}
|
<span style="display:inline-block; width: 20px;"></span>
|
{| class="wikitable"
|-
! AJA2
! Material
! Liner
|-
| 1
| Au
| Tungsten
|-
| 2
| Titanium
| FabMate
|-
| 3
| Al
| Intermetallic
|-
| 4
| Pd
| intermetallic
|-
| 5
| Ge
| FabMate
|-
| 6
| Pt
| FabMate
|-
| DC1
| ReMo
| --
|-
| RF2
| NbTi
| --
|-
|}
|-
|}

Revision as of 13:25, 23 May 2023

Overview

Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Currently loaded materials

The materials currently available for deposition are : Ti ( crucible 1 ) and Al ( crucible 2

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