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Created page with "= Lithography = * e-Line Litho * Elionix * Raith eLine * Heidelberg µUPG 501 LED writer * Süss mask aligner = Thin film deposition = * AJA systems * E-Gun evaporator * Spin..." |
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= Lithography = | {| | ||
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! Lithography !! Thin film processing !! Characterization !! Other | |||
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* e-Line Litho | * e-Line Litho | ||
* Elionix | * Elionix | ||
* Raith eLine | * Raith eLine | ||
* Heidelberg µUPG 501 | * Heidelberg µUPG 501 | ||
* Süss mask aligner | * Süss mask aligner | ||
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* AJA systems | * AJA systems | ||
* E-Gun evaporator | * E-Gun evaporator | ||
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* DC sputter | * DC sputter | ||
* MBE | * MBE | ||
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* JEOL JSM 6320F | * JEOL JSM 6320F | ||
* JEOL JSM 7800F | * JEOL JSM 7800F | ||
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* Optical microscopes | * Optical microscopes | ||
* AFM | * AFM | ||
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* Scriber Süss | * Scriber Süss | ||
* Scriber Loomis | * Scriber Loomis | ||
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* K&S Ball Bonder | * K&S Ball Bonder | ||
* Edwards evaporator | * Edwards evaporator | ||
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Revision as of 22:29, 14 February 2016
| Lithography | Thin film processing | Characterization | Other |
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