Cambridge ALD: Difference between revisions
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| Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050] | | Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050] | ||
|- | |- | ||
| Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #ff9f9f" | | | Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #ff9f9f" | Yes || [https://doi.org/10.1134/1.1626763] | ||
|} | |} | ||
Revision as of 15:52, 19 February 2021
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Essentials | |
---|---|
Full name | Savannah S100 (gen. 1) |
Manufacturer | Cambridge NanoTech (Veeco) |
Description | Atomic layer deposition system |
Location | Cleanrooms 1 & 2 |
Responsibility | |
Primary | Martin |
Secondary | Karolis |
Growth per cycle (GPC) monitoring
Available processes
Deposited material | Precursor | ALD1 | ALD2 | Ref. |
---|---|---|---|---|
Hafnium oxide (HfOx, HfO2) | Yes | Yes | [1] | |
Aluminum oxide (AlOx, Al2O3) | Yes | Yes | [2] |
Standard operating procedure
- Open valve on top of the nitrogen bottle.
- Check nitrogen bottle pressure. Main bottle pressure should be at least 5 bar, line pressure 3 bar (AJA1) 1-2 bar (AJA2).
- If line pressure is outside of range, carefully adjust the regulator valve with the flow set to 20 sccm.
- Make sure the valves of all precursors inside the ALD machine are closed.
- ALD1 only: run recipe Default_cleaning to pump out any residual gas in the gas lines.
- With flow set to 0 the actual flow can be between 0-1 sccm.
- Press the big round VENT or VENT REACTOR button.
- Open the metal lid.
- Put your sample inside, roughly in the center, away from the gas inlet and outlet.
- Check whether the rubber O-ring is properly seated.
- Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.
- Press the big round PUMP or PUMP REACTOR button.
- Pressure with flow set to 0: ~5e-2 Torr or lower.
- Place the metal cage on top of the tool.
- Open relevant precursor valves.
- Run your recipe.
- Pressure with 20 sccm N2 flow present: low e-1 Torr.
- ALD1 pulse lengths: H2O ~0.5 s, HfOx TDMAH 0.2 s, AlOx TMA 0.02 s.
- ALD2 pulse lengths: H2O ~0.02 s, HfOx TDMAH 0.2-0.5 s.
- Close precursor valves.
- Press the big round VENT or VENT REACTOR button.
- Place the metal cage on the side of the tool.
- Take out your sample. Check the rubber o-ring.
- Press the big round PUMP or PUMP REACTOR button.
- Close the nitrogen bottle valve on top of the bottle.
- Run recipe Default_heater_set.
Technical notes
- Recipe file location
- ALD1: C:\Savannah\Users\Standard\
- ALD2: C:\Cambridge Nanotech\Recipes\
- Log file location
- ALD1: C:\ALD data. Includes pressure data, screenshot at termination.
- ALD2: C:\Cambridge Nanotech\Log\. Includes pressure and heater temperature data, screenshot at termination, software event logs.
Troubleshooting
- Pressure reading obviously wrong (above 1e3 Torr or below 1e-4 Torr):
- Pressure gauge failure. Unplug the network cable from the small square pressure gauge beneath the chamber and plug it back in. The pressure reading should return to expected values.
- No peak visible during precursor pulse:
- Precursor valves closed. Make sure the relevant precursor valves are open. Consult the labels on the inside of the door.
- Pulse time too short. Select the lowest plotting interval and check whether you can spot a small peak when the automatic valve opens. Increase pulse time as needed.
- Cannot open lid upon venting:
- Chamber pressure still below atmosphere. Confirm pressure reading in software. If pressure is below 5e2 Torr, check whether the nitrogen bottle valve is open.
- Rubber O-ring can get stuck to the lid. Gently but firmly lift the lid. Reseat the O-ring if needed.