Cambridge ALD: Difference between revisions

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| Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050]
| Hafnium oxide (HfOx, HfO<sub>2</sub>)|| <div class="toccolours mw-collapsible mw-collapsed width:400px" style="width:300px"> TDMAH <div class="mw-collapsible-content">tetrakis(dimethylamino)hafnium <br/> [(CH<sub>3</sub>)<sub>2</sub>N]<sub>4</sub>Hf <br/> [[File:TDMAH.png|246px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #c6e0b4" | Yes || [https://doi.org/10.1016/j.tsf.2005.05.050]
|-
|-
| Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #ff9f9f" | No || [https://doi.org/10.1134/1.1626763]
| Aluminum oxide (AlOx, Al<sub>2</sub>O<sub>3</sub>) || <div class="toccolours mw-collapsible mw-collapsed" style="width:300px> TMA <div class="mw-collapsible-content">trimethylaluminum <br/> (CH<sub>3</sub>)<sub>3</sub>Al <br/> [[File:TMA.png|290px]]</div></div> || style="background-color: #c6e0b4" | Yes || style="background-color: #ff9f9f" | Yes || [https://doi.org/10.1134/1.1626763]
|}
|}



Revision as of 15:52, 19 February 2021

Cambridge ALD
Picture of Cambridge ALD text
Essentials
Full nameSavannah S100 (gen. 1)
ManufacturerCambridge NanoTech (Veeco)
DescriptionAtomic layer deposition system
LocationCleanrooms 1 & 2
Responsibility
PrimaryMartin
SecondaryKarolis

Growth per cycle (GPC) monitoring

Available processes

Deposited material Precursor ALD1 ALD2 Ref.
Hafnium oxide (HfOx, HfO2)
TDMAH
tetrakis(dimethylamino)hafnium
[(CH3)2N]4Hf
Yes Yes [1]
Aluminum oxide (AlOx, Al2O3)
TMA
trimethylaluminum
(CH3)3Al
Yes Yes [2]

Standard operating procedure

  • Open valve on top of the nitrogen bottle.
  • Check nitrogen bottle pressure. Main bottle pressure should be at least 5 bar, line pressure 3 bar (AJA1) 1-2 bar (AJA2).
    If line pressure is outside of range, carefully adjust the regulator valve with the flow set to 20 sccm.
  • Make sure the valves of all precursors inside the ALD machine are closed.
  • ALD1 only: run recipe Default_cleaning to pump out any residual gas in the gas lines.
    With flow set to 0 the actual flow can be between 0-1 sccm.
  • Press the big round VENT or VENT REACTOR button.
  • Open the metal lid.
  • Put your sample inside, roughly in the center, away from the gas inlet and outlet.
    Check whether the rubber O-ring is properly seated.
  • Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.
  • Press the big round PUMP or PUMP REACTOR button.
    Pressure with flow set to 0: ~5e-2 Torr or lower.
  • Place the metal cage on top of the tool.
  • Open relevant precursor valves.
  • Run your recipe.
    Pressure with 20 sccm N2 flow present: low e-1 Torr.
    ALD1 pulse lengths: H2O ~0.5 s, HfOx TDMAH 0.2 s, AlOx TMA 0.02 s.
    ALD2 pulse lengths: H2O ~0.02 s, HfOx TDMAH 0.2-0.5 s.
  • Close precursor valves.
  • Press the big round VENT or VENT REACTOR button.
  • Place the metal cage on the side of the tool.
  • Take out your sample. Check the rubber o-ring.
  • Press the big round PUMP or PUMP REACTOR button.
  • Close the nitrogen bottle valve on top of the bottle.
  • Run recipe Default_heater_set.

Technical notes

  • Recipe file location
    ALD1: C:\Savannah\Users\Standard\
    ALD2: C:\Cambridge Nanotech\Recipes\
  • Log file location
    ALD1: C:\ALD data. Includes pressure data, screenshot at termination.
    ALD2: C:\Cambridge Nanotech\Log\. Includes pressure and heater temperature data, screenshot at termination, software event logs.

Troubleshooting

  • Pressure reading obviously wrong (above 1e3 Torr or below 1e-4 Torr):
    • Pressure gauge failure. Unplug the network cable from the small square pressure gauge beneath the chamber and plug it back in. The pressure reading should return to expected values.
  • No peak visible during precursor pulse:
    • Precursor valves closed. Make sure the relevant precursor valves are open. Consult the labels on the inside of the door.
    • Pulse time too short. Select the lowest plotting interval and check whether you can spot a small peak when the automatic valve opens. Increase pulse time as needed.
  • Cannot open lid upon venting:
    • Chamber pressure still below atmosphere. Confirm pressure reading in software. If pressure is below 5e2 Torr, check whether the nitrogen bottle valve is open.
    • Rubber O-ring can get stuck to the lid. Gently but firmly lift the lid. Reseat the O-ring if needed.