Training: Difference between revisions

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* You'll also need a software session of about 0.5 hrs.
* You'll also need a software session of about 0.5 hrs.
* Before any training slots are booked on the tool you'll need all of the following to prepared:
* Before any training slots are booked on the tool you'll need all of the following to prepared:
** Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins.
** Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins. This chip will be used for sessions  1 & 2. This has to be a dummy chip.
** A design (gds, dxf, cif) with:
** A chip for your 3rd session. This is a "real" chip. Plan this internally within your sub group.
** A design (gds, dxf, cif) for sessions 1 & 2 with:
*** 4 alignment crosses (find out what marks work on the tool from your sub-group).
*** 4 alignment crosses (find out what marks work on the tool from your sub-group).
*** Something to break the symmetry so you can tell chip orientation with your bare eye
*** Something to break the symmetry so you can tell chip orientation with your bare eye
*** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
*** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
*** Something creative, somethin fun :) This is an exercise in learning CAD as well.
*** Something creative, somethin fun :) This is an exercise in learning CAD as well.
** Then follow workflow 3 at [https://wiki.nbi.ku.dk/qdevwiki/ElionixCheatSheet Qdev wiki] to convert your design file into the Elionix exposure format *co7
** A design for the "real" chip to be exposed in session 3.
** Then follow workflow 3 at [https://wiki.nbi.ku.dk/qdevwiki/ElionixCheatSheet Qdev wiki] to convert your design files into the Elionix exposure format *co7. Make dedicated folders for each exposure.
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Heidelberg upg501
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Revision as of 13:28, 28 November 2017

Getting trained on tool. Expand the relevant tool section below:

Elionix

  • You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use a tool.
  • You'll need 3 sessions of about 2.5 hrs each on the tool to get trained on this tool.
  • You'll also need a software session of about 0.5 hrs.
  • Before any training slots are booked on the tool you'll need all of the following to prepared:
    • Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins. This chip will be used for sessions 1 & 2. This has to be a dummy chip.
    • A chip for your 3rd session. This is a "real" chip. Plan this internally within your sub group.
    • A design (gds, dxf, cif) for sessions 1 & 2 with:
      • 4 alignment crosses (find out what marks work on the tool from your sub-group).
      • Something to break the symmetry so you can tell chip orientation with your bare eye
      • A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
      • Something creative, somethin fun :) This is an exercise in learning CAD as well.
    • A design for the "real" chip to be exposed in session 3.
    • Then follow workflow 3 at Qdev wiki to convert your design files into the Elionix exposure format *co7. Make dedicated folders for each exposure.

Heidelberg upg501

  • Item 1
  • Item 2
    • Sub item 1
    • Sub item 2

Raith e-Line

AJA metallization, sputtering or ion milling

ALD 1 & 2