Training: Difference between revisions
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* You'll also need a software session of about 0.5 hrs. | * You'll also need a software session of about 0.5 hrs. | ||
* Before any training slots are booked on the tool you'll need all of the following to prepared: | * Before any training slots are booked on the tool you'll need all of the following to prepared: | ||
** Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins. | ** Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins. This chip will be used for sessions 1 & 2. This has to be a dummy chip. | ||
** A design (gds, dxf, cif) with: | ** A chip for your 3rd session. This is a "real" chip. Plan this internally within your sub group. | ||
** A design (gds, dxf, cif) for sessions 1 & 2 with: | |||
*** 4 alignment crosses (find out what marks work on the tool from your sub-group). | *** 4 alignment crosses (find out what marks work on the tool from your sub-group). | ||
*** Something to break the symmetry so you can tell chip orientation with your bare eye | *** Something to break the symmetry so you can tell chip orientation with your bare eye | ||
*** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas. | *** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas. | ||
*** Something creative, somethin fun :) This is an exercise in learning CAD as well. | *** Something creative, somethin fun :) This is an exercise in learning CAD as well. | ||
** Then follow workflow 3 at [https://wiki.nbi.ku.dk/qdevwiki/ElionixCheatSheet Qdev wiki] to convert your design | ** A design for the "real" chip to be exposed in session 3. | ||
** Then follow workflow 3 at [https://wiki.nbi.ku.dk/qdevwiki/ElionixCheatSheet Qdev wiki] to convert your design files into the Elionix exposure format *co7. Make dedicated folders for each exposure. | |||
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Heidelberg upg501 | |||
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Revision as of 13:28, 28 November 2017
Getting trained on tool. Expand the relevant tool section below:
Elionix
- You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use a tool.
- You'll need 3 sessions of about 2.5 hrs each on the tool to get trained on this tool.
- You'll also need a software session of about 0.5 hrs.
- Before any training slots are booked on the tool you'll need all of the following to prepared:
- Si chip (5-10 mm square) spin coated with A2 and baked at 185C/2mins. This chip will be used for sessions 1 & 2. This has to be a dummy chip.
- A chip for your 3rd session. This is a "real" chip. Plan this internally within your sub group.
- A design (gds, dxf, cif) for sessions 1 & 2 with:
- 4 alignment crosses (find out what marks work on the tool from your sub-group).
- Something to break the symmetry so you can tell chip orientation with your bare eye
- A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
- Something creative, somethin fun :) This is an exercise in learning CAD as well.
- A design for the "real" chip to be exposed in session 3.
- Then follow workflow 3 at Qdev wiki to convert your design files into the Elionix exposure format *co7. Make dedicated folders for each exposure.
Heidelberg upg501
- Item 1
- Item 2
- Sub item 1
- Sub item 2
Raith e-Line
AJA metallization, sputtering or ion milling
ALD 1 & 2