Plassys Evaporator: Difference between revisions
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The system has the capability of in-situ oxidation . | The system has the capability of in-situ oxidation . | ||
Film Quality : | Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023) | ||
== Currently loaded materials == | == Currently loaded materials == | ||
Latest revision as of 09:16, 20 June 2023
Overview
Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .
Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)
Currently loaded materials
Substrates allowedSilicon and Sapphire only |