Plassys Evaporator: Difference between revisions

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== Overview ==
== Overview ==


Plassys system is for thin film deposition by electron beam evaporation. It also provides an ion gun for surface preparation and etching purposes.  
Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication.
The system has the capability of in-situ oxidation .
It also provides an ion gun for surface preparation and etching purposes.  
The system has the capability of in-situ oxidation .  
 
Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)


== Currently loaded materials ==
== Currently loaded materials ==
The materials currently available for deposition are :
Ti ( crucible 1 ) and Al ( crucible 2)


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Latest revision as of 09:16, 20 June 2023

Overview

Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .

Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)

Currently loaded materials

Crucible position Material Comment
1 Ti Plassys ( currently In Use)
2 Al Plassys ( Material consumed)
3 Al Melted. Currently In Use
4 Al new pellets. Not melted

Substrates allowed

Silicon and Sapphire only

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