Plassys Evaporator: Difference between revisions
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== Overview == | == Overview == | ||
Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. | |||
The system has the capability of in-situ oxidation . | It also provides an ion gun for surface preparation and etching purposes. | ||
The system has the capability of in-situ oxidation . | |||
Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023) | |||
== Currently loaded materials == | == Currently loaded materials == | ||
{| | {| | ||
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{| class="wikitable" | {| class="wikitable" | ||
|- | |- | ||
! | ! Crucible position | ||
! Material | ! Material | ||
! | ! Comment | ||
|- | |- | ||
| 1 | | 1 | ||
| | | Ti | ||
| | | Plassys ( currently In Use) | ||
|- | |- | ||
| 2 | | 2 | ||
| | | Al | ||
| | | Plassys ( Material consumed) | ||
|- | |- | ||
| 3 | | 3 | ||
| | | Al | ||
| | | Melted. Currently In Use | ||
|- | |- | ||
| 4 | | 4 | ||
| Al | | Al | ||
| | | new pellets. Not melted | ||
|} | |} | ||
== Substrates allowed == | |||
Silicon and Sapphire only |
Latest revision as of 09:16, 20 June 2023
Overview
Physical vapor deposition tool of aluminum via e-beam evaporation for Josephson junction fabrication. It also provides an ion gun for surface preparation and etching purposes. The system has the capability of in-situ oxidation .
Film Quality : Surface roughness - 1.6 nm for 100nm thick film ( scan area 2 um /AFM Analysis ( June 2023)
Currently loaded materials
Substrates allowedSilicon and Sapphire only |