Design template for lithography training: Difference between revisions
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=Introduction= | |||
We recommend using a combination of the following tools for designing devices: | We recommend using a combination of the following tools for designing devices: | ||
* Klayout or CleWin (only for Windows) | * Klayout or CleWin (only for Windows) | ||
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* design_template.ipynb | * design_template.ipynb | ||
* layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA'' | * layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA'' | ||
=Design requirements= | |||
Revision as of 17:14, 17 February 2026
Introduction
We recommend using a combination of the following tools for designing devices:
- Klayout or CleWin (only for Windows)
- Phidl (python-based)
- Copilot (great tool to boost your productivity)
There is a code you can use as a basis to build the design for your EBL trainings.
You can find them on N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training.
- CR_template_training.gds design with alrignment marks and vernier patterns (~27mins exposure time)
- design_template.ipynb
- layer1_training.ftxt BEAMER file for elionix 100keV with 500pA