Resist spin coating: Difference between revisions

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** Set the timer for baking
** Set the timer for baking
<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
* AZ photoresists: 115 \textdegrees C for 1 min
* AZ photoresists: 115°C for 1 min
* e-beam resists: 185 \textdegrees C for 2 mins
* e-beam resists: 185°C for 2 mins
</blockquote>
</blockquote>
* Once your recipe is done, open the lid
* Once your recipe is done, open the lid

Revision as of 12:31, 19 December 2024

How to behave

  • Always think of safety first!
  • Wait patiently for the previous user to finish their process in the spin coater and then you can start using the fumehoom.
  • Minimise the duration for which the resist bottle stays open (without a lid).
  • Clean the spinner and the chuck until there are no resist marks left
    • Use 1,3 Dioxolane for CSAR and LOR3B resists
    • In any other case, use Acetone
  • Is a resist missing? Not it in the whiteboard in the gowning area.

How to spin coat

  • Log your process in the designated Google-Sheets file (date, name, resist stack):
    • CR1: PC with Olympus microscope
    • CR2: PC with Olympus microscope
  • Take the resist from the cabinet
  • In a cleanroom wipe, write your name to let users know who is using the fumehood
  • Choose the correct chuck with respect to your chip size

You can follow this guide for the smallest dimension of your chip:

  • <5mm: small chuck
  • 6-10mm: medium chuck
  • >10mm: large chuck
  • 2-inch wafers or larger: No chuck
  • Place the chuck on the stage
  • Place your chip on the chuck
  • Center your chip and press Vacuum
    • If you think that your chip is not centered, repeat this step
  • Choose a spinner recipe
  • Close the lid
  • Choose a pipette
    • Hold the pipette with one hand
    • With the other hand, open the resist bottle
    • Squize a sufficient amount of resist
    • Close the resist bottle
    • Deposit a sufficient amount of resist on your chip via the hole on top of the lid
      • You should cover the entire chip surface
      • Avoid the formation of bubbles
      • You should be able to observe surface tension from the resist liquid on top of your chip
      • You should stop pouring resist before the surface tension collapses and the resist spills on the sides of your chip
  • Play the recipe
  • While your recipe is running:
    • Return the resist bottle to the designated place in the cabinet
    • Set the timer for baking
  • AZ photoresists: 115°C for 1 min
  • e-beam resists: 185°C for 2 mins
  • Once your recipe is done, open the lid
  • Press Vacuum to disable the vacuum from the back of your chip
  • Transfer your chip to the hot plate for baking and start the timer
  • Start cleaning the spinner
    • You should spend a significant amount of time cleaning the spinner
      • Clean the chuck
      • Clean carefully inside the spinner (both at the bottom and inside the lid)
      • Don't forget the top hole
  • Remove your sample from the hot plate and store it in your sample box
  • Keep cleaning the spinner until it is spotless
  • Log your cleaning in the Google-sheets (cleaning agents, comments)
  • Tidy up the fumehood for the following user
  • Continue with the next steps of your process