Resist spin coating: Difference between revisions
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Created page with "= How to behave = * Always think of safety first! * Wait patiently for the previous user to finish their process in the spin coater and then you can start using the fumehoom. * Minimise the duration for which the resist bottle stays open (without a lid). * Clean the spinner and the chuck until there are no resist marks left ** Use 1,3 Dioxolane for CSAR and LOR3B resists ** In any other case use Acetone = How to spin coat = * Log your process in the designat..." |
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* Clean the spinner and the chuck until there are no resist marks left | * Clean the spinner and the chuck until there are no resist marks left | ||
** Use 1,3 Dioxolane for CSAR and LOR3B resists | ** Use 1,3 Dioxolane for CSAR and LOR3B resists | ||
** In any other case use Acetone | ** In any other case, use Acetone | ||
* Is a resist missing? Not it in the whiteboard in the gowning area. | |||
= How to spin coat = | = How to spin coat = |
Revision as of 17:31, 16 December 2024
How to behave
- Always think of safety first!
- Wait patiently for the previous user to finish their process in the spin coater and then you can start using the fumehoom.
- Minimise the duration for which the resist bottle stays open (without a lid).
- Clean the spinner and the chuck until there are no resist marks left
- Use 1,3 Dioxolane for CSAR and LOR3B resists
- In any other case, use Acetone
- Is a resist missing? Not it in the whiteboard in the gowning area.
How to spin coat
- Log your process in the designated Google-Sheets file (date, name, resist stack):
- CR1: PC with Olympus microscope
- CR2: PC with Olympus microscope
- Take the resist from the cabinet
- In a cleanroom wipe, write your name to let users know who is using the fumehood
- Choose the correct chuck with respect to your chip size:
- <5mm: small chuck
- 6-10mm: medium chuck
- >10mm: large chuck
- 2-inch wafers or larger: No chuck
- Place the chuck on the stage
- Place your chip on the chuck
- Center your chip and press Vacuum
- If you see that your chip is not centered, repeat this step
- Choose a spinner recipe
- Close the lid
- Choose a pipette
- Hold the pipette with one hand
- With the other hand, open the resist bottle
- Squize a sufficient amount of resist
- Close the resist bottle
- Deposit a sufficient amount of resist on your chip via the hole on top of the lid
- You should cover the entire chip surface
- Avoid the formation of bubbles
- You should be able to observe surface tension from the resist liquid on top of your chip
- You should stop pouring resist before the surface tension collapses and the resist spills on the sides of your chip
- Play the recipe
- While your recipe is running:
- Return the resist bottle to the designated place in the cabinet
- Set the timer for baking
- Rule of thumb:
- AZ photoresists: 115 \textdegrees C for 1 min
- e-beam resists: 185 \textdegrees C for 2 mins
- Rule of thumb:
- Once your recipe is done, open the lid
- Press Vacuum to disable the vacuum on the back of your chip
- Transfer your chip to the hot plate for baking and start the timer
- Start cleaning the spinner
- You should spend a significant amount of time cleaning the spinner
- Clean the chuck
- Clean carefully inside the spinner, both at the bottom and inside the lid. Don't forget the top hole!
- You should spend a significant amount of time cleaning the spinner
- Remove your sample from the hot plate and store it in your sample box
- Keep cleaning that spinner until it is spotless
- Log your cleaning in the Google-sheets
- Tidy up the fumehood for the next user
- Continue with the next steps of your process